Used AMAT / APPLIED MATERIALS Centura Hart AP #9177851 for sale

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AMAT / APPLIED MATERIALS Centura Hart AP
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ID: 9177851
Wafer Size: 12"
Deep trench etch, 12".
AMAT / APPLIED MATERIALS Centura Hart AP is a high-powered plasma etch reactor designed for premier performance in semiconductor manufacturing applications. This high-performance plasma etch reactor is capable of producing precise and reproducible etch results every time. Its cutting-edge design enables it to deliver results with superior repeatability and transistor-level accuracies. AMAT Centura Hart AP is built from an array of mechanical components, electronics, and an advanced plasma process kit. It utilizes an electrostatic chuck to precisely mount and etch the target material. The reactor also features an array of sensors which provide accurate readings throughout the etching process, allowing for optimum process control. The reactor is designed with multiple pumps to achieve a suitable atmosphere in the reaction chamber. It also features a vacuum system with a gas-injecting nozzle, as well as ion detector and emission monitor ports to further optimize the chamber conditions. APPLIED MATERIALS Centura Hart AP's etch process is capable of achieving a wide range of etch factors and profile shapes. The reactor includes the latest in plasma wafer processing technologies, such as the "multi-point substrate analysis" alignment to ensure an improved repeatability of etching results. Its advanced monitoring systems can additionally diagnose performance issues during operation, allowing the user to quickly adjust parameters for improved results. Centura Hart AP is designed to be an environmentally friendly reactor, minimizing the emissions and utilizing an eco-friendly code of operation. Additionally, its advanced materials processing program enables users to confidently etch non-toxic, energy-efficient, and high-performance materials with minimal consumables use. AMAT / APPLIED MATERIALS Centura Hart AP is an ideal solution for multiple advanced and fine-tuned applications in semiconductor manufacturing. Its high-performance etching capabilities and reliable process repeatability ensure high-level accuracy in production. This reactor provides excellent performance and runs economically with minimal environmental impact, making it a premier choice for modern manufacturing processes.
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