Used ADVANCED SPIN SYSTEM INC / ASSI SV-702 #9132536 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

ADVANCED SPIN SYSTEM INC / ASSI SV-702
Sold
ID: 9132536
Vintage: 2005
Spin rinse dryer (SRD) 2005 vintage.
ADVANCED SPIN Equipment INC / ASSI SV-702 photoresist system is an advanced productivity tool designed for automated semiconductor wafer processing. This automated photoresist unit is capable of rapid coat, spin and expose processes for wafer surface processing. The machine includes component elements such as a power supply, controllers, vacuum table and a light shutter motor, which enable improved performance for wafer processing. ASSI SV-702 utilizes advanced spin coating technology, which is especially beneficial when used for thin film deposition. This technology controls the spin speed, time and temperature, allowing users to precisely control the amount of coating material on the substrate surface. This precision is also beneficial for spin drying applications when rapid and even drying is required. The vacuum table holds the wafer securely during the spin coating, dry, exposure and development processes. The exposure process utilizes an electronic light gate and shutter motor, which allow the user to precisely control the exposure time and amount of light dose. The user can also control the type of exposure, such as flood exposure, or metal lift-off exposure. The redevelopment capability of the tool allows for the re-exposure and discovery of any pattern that has previously been developed. The asset also has an advanced wafer carrier model that allows users to easily transfer and position the wafer during the different processing steps. ADVANCED SPIN Equipment INC SV-702 also incorporates a comprehensive computer control system with a color graphics monitor, keypad and software that allows for the creation of multiple exposure parameter sets. The automated control unit allows users to quickly set and adjust the exposure parameters and run different jobs with minimal effort. SV-702 photoresist machine is an ideal tool for high-precision wafer processing and surface coating. It is equipped with advanced spin coating technology and a vacuum table with light gate and shutter motor that enable users to achieve precise exposure processes. The integrated redevelopment capability and wafer carrier tool further enhance the process automation for fast and repeatable wafer processes. The automated control asset enables users to conveniently adjust exposure parameters, making complex wafer processes and thin film deposition easier and faster.
There are no reviews yet