Used ADVANCED SPIN SYSTEM INC / ASSI SV-702 #9132537 for sale

ADVANCED SPIN Equipment INC / ASSI SV-702 is a specialized photoresist system for the processing of semiconductor wafers. It is a continued innovation in the field of photoresist technology. This unit is designed to optimize the accuracy and throughput of the photoresist process and to drastically reduce wafer alignment errors. The core component of this machine is its spin tower, which allows the tool to achieve high speeds and accuracy. The tower is equipped with an advanced CCD camera asset that precisely aligns and evenly distributes photoresist over the wafer. A digital filtering model is also included to provide optimal wafer processing results. ASSI SV-702 is highly efficient, with a maximum spin speed of 3,500 rpm. It is capable of automatically stopping motion when the photoresist reaches the edge of the wafer, ensuring that the layer of photoresist applied to the wafer is uniform and without any gaps. This allows the wafers to achieve higher purity and accuracy. Additionally, the spin tower is equipped with a digital temperature sensor and a heating/cooling element, which can be used to precisely control the temperature of the wafer prior to and during its processing. ADVANCED SPIN Equipment INC SV-702 also expedites the cleaning process of photoresist from the wafer. This system utilizes well-engineered transfer mechanisms that significantly reduce the amount of time required for cleaning. The cleaning mechanism is also capable of simultaneaously spinning and spraying photoresist from the wafer, further expediting the cleaning process. In addition, the cleaning mechanism includes a chemical dilution mode and a semiconductor resist dryer that allow for quick drying of the resist layer after completion of the cleaning process. SV-702 is a state-of-the-art photoresists unit that provides unmatched processing accuracy and speed for semiconductor wafers. It has advanced features such as an optical CCD alignment machine, a digital temperature sensor, and a resist dryer. These features are designed to provide optimum wafer processing results and to drastically reduce wafer alignment errors. This tool is a valuable addition to any semiconductor production facility.