Used DNS / DAINIPPON SK-2000 #118481 for sale
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ID: 118481
Wafer Size: 8"
Vintage: 2003
Spin coater / Developer DUV track system, 8"
Wafer flow direction: L-type
Wafer type: Notch
IF-B
Spinner unit configuration:
(2) Coaters
B-ARC (2) Coaters
(3) Developers
Indexer:
Left type
Wafers: SEMI Standard wafers / Notch type
Standard type
(4) Uni cassettes
Coater:
SC1 (Unit 3) & SC2 (Unit 4):
Includes:
Cups
EBR Function
Resist lines: 8 Line
Resist pump: PDS-105G-KPV4
Cup rinse function
Back side rinse
Cup rinse
Pot rinse
EBR (Edge bead removal)
Prewet function
SC3 (Unit 5) & SC4 (Unit 6):
Cups: 1
Includes:
EBR Function
Resist pump: PDS-105G-KPV4
Resist lines: 4 Line
Cup rinse function
Back side rinse
Cup rinse
Pot rinse
EBR (Edge bead removal)
Prewet function
Bake:
HP: (6) Units (8, 9, 11, 12, 17, 18)
RHP: (8) Units (25, 26, 28, 29, 31, 32, 35, 36)
CP: (7) Units (7, 10, 16, 24, 27, 30, 34)
AHL: (3) Units (13, 14, 15)
EEW: Unit (33)
Developer:
SC1 (Unit 3) & SC2 (Unit 4):
Cups
Developer number nozzle
DIW Rinse nozzle
Back side rinse line
Flow meters with sensor: DEV, DIW1, DIW2, Back-side rinse, ORG, FWD
Includes:
Dev1
Prewet
DIW1
Back side rinse
TR Includes:
TR1 Arm
TR2 Arm
TR3 Arm
Others:
Thermo controller model: CET-CU, Mass 7kg
THC Model: SPC-2313-UC-A
CP Controller model: FRD-A200-UC
HMDS Supply type: Quart bottle to buffer tank
Thinner supply type: Canister tank
Developer supply type: Facility supply
EEW:
Unit (33)
Lamp house type with lamp house
Miscellaneous:
Signal tower lamp: 3 Color (Red, orange, green)
Sub module configuration:
Source bottle cabinet
SC Cabinet
ETU Cabinet
Controller cabinet
IFB ACU Cabinet
Input power supply box
Main gas valve close
Gas (Air, N2) line purge
Chemical (Developer, DIW) line purge
Drain PCW end capping
Gas line (N2) end capping
Chemical (Developer, DIW) line end capping
Spin unit (Coater & developer) exhaust line caping
Bake unit exhaust line caping
Leak check
Main power: 3 Phase, 200 V, full load 20.44 kVA, 59A
50/60 Hz, 3 Wires and GND/PE
Rating 400A, AIC 65kA, motor 8A
2003 vintage.
DNS / DAINIPPON SK-2000 is a high-performance photoresist equipment developed for the processing of micro-fine patterns. The system utilizes a unique, advanced, precision-camera imaging unit designed to provide perfect registration and exposure control, as well as allowing the use of a wide range of photo resist materials. For optimal exposure and greatest flexibility, both contact and projection tools are available. The advanced contact exposure tool produces extremely high-quality image registration, providing a perfectly uniform exposure across the entire surface of the photomask. The projection exposure tool is designed to reduce distortion of fine devices through the application of a high-accuracy optical machine, which ultimately increases exposure accuracy, linearity and yield. The tool also offers advanced capabilities such as sub-micron resolution, 0.15 micron minimum exposure uniformity and exposure stability control features. The sub-micron resolution ensures that extremely small lithography features can be achieved with excellent accuracy and detail. The exposure stability control features allow for precise adjustments to not only the exposure level but also the duration, which are critical for consistent results. The asset boasts of a high-speed mode for ultra-high-temperature exposure, increasing throughput and reducing process time. Another feature of this model is its ability to switch exposure wavelengths from a single source, enabling multiple sensitivities to be utilized for different exposure types. About DNS SK2000 photoresist equipment, the design offers strong robustness to temperature variation and reduces particles significantly, increasing overall exposure reliability. Overall, this system offers an optimal solution for lithography applications requiring ultra-fine patterns.
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