Used FSI / TEL / TOKYO ELECTRON Mercury #9073573 for sale
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ID: 9073573
Wafer Size: 6" - 8"
Spray processor
(6) Cassettes for 6" wafers
(4) Cassettes for 8" wafers
PLC Controller
15" Touchscreen LCD display
PFA High purity pneumatic operated valve
No metal contamination
In line ultrapure DI water heater
Canister console
Recirculation tank for HF / BOE
Chamber temperature measurement
(52) Modernized helios:
Communication compatible with FSI Mercury over RS232
RJ45 Ethernet communication
Modern and reliable SSR relay
Touch screen display operation
Intuitive user interface
Auto adaptive temperature regulation
High reliability
Events archive
Modernized safety features
Remote control and supervision
Process availability:
B Clean
C Clean
RCA Clean
SC1 Clean
SC2 Clean
Oxide etch
Ozone clean
Piranha clean
Rise and dry
Canister configuration:
1st canister console: H2SO4, HCl, DHF canisters
2nd canister console: H2O2, NH4OH canisters
Flow meter configuration:
H2SO4 - 200 - 2000 sccm
HCl - 30 - 400 sccm
DHF - 200 - 2000 sccm
H2O2 - 30 - 400 sccm
NH4OH - 30 - 400 sccm
Dual exhaust configuration:
(2) Drain
PFA 6" / (6) Position turntable included
Control system with HMI
Valves and PFA lines in process console
Not included:
Filter cartridges
Controller with HMI interface.
FSI MERCURY is a photoresist equipment designed to enable precise etching of micro and nanoscale features on silicon wafers commonly used in the microelectronics industry. Photoresist technology involves exposing a type of photosensitive film, known as photoresist, to a precise light-based pattern in order to create precise patterns or features on semiconductor substrates in photolithography fabrication processes. MERCURY is an addition to FSI product line, designed to enable the production of more advanced and intricate features than other FSI products. The system utilizes direct laser patterning, which features a focus size of less than 10 μm in order to create patterns with an accuracy of up to 0.1 μm - providing superior resolution when etching complex micro and nanoscale patterns. The unit has a unique chemical machine that enables faster etching times in comparison to other photoresist products - reducing the time and cost associated with electron beam patterning. The chemical tool, in conjunction with superior resolution, also means that narrow lines can be produced without the presence of edge-overshoot, meaning the patterning process is extremely precise, with minimum defects. FSI MERCURY asset also features low water absorption with excellent shelf life, and has a wide exposure range. The model also works well with multiple complimentary processes, including ozone and plasma treatment, which can assist in optimizing the selectivity between the resist and TKW (Thermo-Ketone Watersoluble) layer. The equipment is also highly reliable, with a record of minimal downtime, meaning production processes are consistent and efficient. Overall, MERCURY is an advanced photoresist product that enables the etching of micro and nanoscale patterns with a superior level of accuracy and resolution. The etching process is shortened due to the system's advanced chemical unit, and the product features excellent storage properties and minimal downtime, making it perfect for use in the microelectronics industry.
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