Used FSI / TEL / TOKYO ELECTRON Mercury #9093020 for sale

FSI / TEL / TOKYO ELECTRON Mercury is a photoresist equipment designed for fabricating integrated circuit components on semiconductor wafers. The system consists of three parts: an illumination unit, a development machine, and a photoresist tool. The illumination asset uses an excimer laser light source to expose the circuit pattern onto the wafer. This pattern is then transferred onto the photoresist, which is a material that can be sensitized to light, by controlling the exposure parameters such as wavelength, pulse width, etching pattern, and dose of exposure. The development model uses a track equipment to deliver a cost effective solution for creating high resolution circuit patterns. The photoresist system includes solutions for developing the exposed circuit pattern and controlling the etching process. This is done using various solutions such as spin-coat and spray-coat processes. Spin-coat uses a rotating substrate to deposit an even and uniform layer of the photoresist on the surface of the wafer while spray-coat uses the reaction of an organic solution onto the wafer to develop the photoresist layer. This photoresist unit uses solvents to control the etching process and obtain the desired circuit pattern. Commonly used solvents include dimethyl sulfoxide (DMSO) and terpineol-I-ol (T-I-O). These solvents are responsible for breaking down the chemical bonds on the surface of the wafer and thus helping the photoresist layer adhere to the pattern. Finally, FSI Mercury utilizes its Spacer technology to form isolation layers which are thin gap-filling pores used to define the boundary of the transistor circuits. The spacer layer helps increase the yield and performance of the transistors by providing an electrically insulated environment. In conclusion, TEL Mercury is a photoresist machine that offers an efficient and reliable solution for fabricating integrated circuits on wafers. It utilizes the light source, development tool, and photoresist asset along with various solvents to form a complete photoresist fabrication model.