Used KARL SUSS / MICROTEC Gamma 60 #9165079 for sale

KARL SUSS / MICROTEC Gamma 60 photoresist equipment is a mask aligner used in a variety of lithography processes. MICROTEC Gamma 60 handles different substrate sizes and thickness with its adjustable, high-precision table. The system is equipped with an advanced stepper-motor for the precise positioning of the substrate. This features a repeatability of 5μm and a maximum speed of 120 steps per second. The working area is designed for the exposure of large-sized substrates, such as wafers and substrates, up to 4-inch in diameter. KARL SUSS Gamma 60 has an advanced stage unit for accurate alignment of photomasks and substrates. Its excellent mechanical stability allows for a large amount of exposure time, and also guarantees a high-precision positioning of the diffraction gratings, thus ensuring quality lithography. The advanced lithography machine features microprocessor-controlled exposure capabilities. Gamma 60 is an all-in-one tool that offers superior efficiency by combining photoresist, baking, flood exposure, and contact functions. The asset's exposure lighting model is equipped with continuous, asynchronous and automatic positioning of the light source, to provide uniform exposure. Additionally, KARL SUSS / MICROTEC Gamma 60 has advanced features such as a high-precision pattern generator, which enables the user to digitize a variety of substrates, including different types of photomasks, diffraction gratings, resolution charts and other objects used for lithography. MICROTEC Gamma 60 is an effective precision mask aligner designed for lithography processes. Its microprocessor-controlled exposure capabilities, adjustable stage equipment, and advanced pattern generator offer superior accuracy and reliability. KARL SUSS Gamma 60 is equipped with a highly reliable and accurate stepper-motor and wide range of exposure light sources, thus allowing for a high-precision lithography process that produces quality results.