Used SEMITOOL 260F #151781 for sale

SEMITOOL 260F
Manufacturer
SEMITOOL
Model
260F
ID: 151781
Wafer Size: Up to 5"
Spin rinse dryer, up to 5".
SEMITOOL 260F photoresist equipment is a state-of-the-art integrated spin-coater/developer designed specifically for the semiconductor industry. It features a rotatable and retractable chamber that can accommodate a maximum 8-inch diameter substrate. 260F comes with a built-in spin motor with adjustable speed and torque, providing precise control over spin-coating processes. The system utilizes precise control over time, temperature, speed and spray pressure of the developer. Temperature control is regulated by precise Pico-Temperature Control™. The chamber design of SEMITOOL 260F includes an automated lift unit, allowing multiple substrates to be spin-coated and developed quickly and efficiently in large batches. The machine is equipped with an air-cooled exhaust port for efficient clearing of all fumes. 260F photoresist tool is powered by a built-in, direct drive brushless motor, providing the optimal torque and speed for each application. The spin-coating performance is enhanced by an advanced two-stage lifting asset, allowing optimum control over wetting, leveling and squeezing of the resist during spin-coating processes. The model also features automated spray technology and precise distribution of developer chemicals. The pressure is precisely monitored so that it can be raised or lowered as needed to suit the substrate, resist and layer-by-layer process. SEMITOOL 260F is equipped with a high-resolution 16-inch LCD display and controller panel, providing the user with a visual feedback of the state of the process. The equipment has an intuitive user interface and multiple built-in convenience functions, making it easy to use and intuitive. 260F photoresist system is a state-of-the-art solution for spin-coating and developing applications in the semiconductor industry. Its comprehensive solution for precise and automated spin-coating, temperature control and a high level of safety, makes it ideal for a wide variety of photoresist processes. The advanced two-stage lift unit and automated spray technology provide the ultimate control and precision in spin-coating and developing operations.
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