Used SEMITOOL 480 #78271 for sale

SEMITOOL 480 is a semiconductor wafer processing machine based on photoresist technology. It is specifically designed to be used in the production of precision semiconductor devices, such as integrated circuits and other microelectronic components. This equipment is built around the concept of photolithography, which is an important step in the manufacturing process for integrated circuits. The photolithography process involves the use of a light source, such as ultraviolet radiation, to transfer a pattern onto a substrate from a photomask. The pattern is then developed using a photoresist and further etched using a suitable chemical or plasma treatment. 480 uses photoresist technology to enable the precise development of patterns on the wafer using ultraviolet radiation. This system features an electron-beam source which is used to expose the photoresist on the wafer in order to create the desired pattern. In addition, the unit includes a critical imaging module (CIM) which provides an accurate, high-resolution image of the photomask. This image is then used as a reference during photolithography to ensure that the correct pattern is exposed, developed and etched onto the wafer. For improved accuracy and uniformity, SEMITOOL 480 also features a programable bevel unit. The bevel unit can be used to adjust the depth of etch in order to facilitate the production of integrated circuits with very small feature dimensions. The machine also includes a temperature control unit, which is used to maintain the photoresist material at the optimal temperature during development. Furthermore, 480 features a high-precision pattern alignment module. This module allows for fast and accurate alignment of the photomask onto the wafer to ensure accurate pattern exposure. In addition, the tool includes advanced software for monitoring and controlling the entire manufacturing process. In summary, SEMITOOL 480 is an advanced photoresist asset that is specifically designed for the manufacture of high-precision semiconductor devices. It features an electron-beam source, programmable bevel unit, temperature control unit and pattern alignment module, all of which enable superior accuracy and uniformity in the development of pattern on wafers. This model is accompanied by comprehensive software for managing and controlling the entire manufacturing process.