Used SEMITOOL 480 #84362 for sale

SEMITOOL 480 is a highly efficient and versatile photoresist equipment designed to produce high-quality imaging results for a wide range of microelectronic applications. The system was designed to meet the needs of the most advanced industries. It includes a vision unit option (optional) that allows the user to optimize imaging of new images, whether they are simple or complex. The machine is also equipped with a plate reader option (optional) that allows users to inspect and monitor the quality of the photos. 480 tool consists of four process chambers, making it capable of processing up to 200 wafers at once. This makes the asset extremely efficient, eliminating the need for multiple processes or multiple machines. SEMITOOL 480's process chambers come with the features needed to create superior quality images while providing superior wafer uniformity and cost-effectiveness. Each of 480's chambers is designed specifically for the application. The first chamber is designed for standard photoresist stripper/developer/metal strip processes. The second chamber is equipped with a coolant sprayer for asphalt photoresist stripping, metal strip processes, and for optimal adhesion of photosensitive films to the substrate. The third chamber is designed for optimized anisotropic wet etching, and the fourth chamber is designed for metals etching. SEMITOOL 480 model also comes with a number of other features and options to maximize performance. These include a recipe-based computer control, manual override controls, automatic thermal compensation, and remote machine control. The equipment is also capable of supporting a wide variety of production speeds and resolutions to meet any imaging needs. 480 ensures high-performance imaging and productivity, offering a wide range of features to ensure that results are always first-class. From its versatile chamber designs to its enhanced processing capabilities, SEMITOOL 480 photoresist system provides the ultimate in efficiency, flexibility, and scalability when imaging microelectronics.