Used SEMITOOL PSC-101 #137503 for sale

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SEMITOOL PSC-101
Sold
Manufacturer
SEMITOOL
Model
PSC-101
ID: 137503
Wafer Size: 6"
Vintage: 2006
Spin rinse dryer, 6", 2006 vintage.
SEMITOOL PSC-101 Photoresist Equipment is a powerful and reliable automated processing system for complex microelectronics fabrication processes. It offers a high degree of flexibility and cost-effectiveness for creating advanced electronic components and devices. SEMITOOL PSC 101 features a dual-chamber unit, designed to work with processes such as resist development, coating, spinning, and baking. The heated bake plate offers a temperature range of up to 200°C and a uniform rate of 5°C/min, while the programmable timer offers a time range of up to 180 seconds. The machine also allows for easy cleaning and maintenance with a detachable wash basket, built-in sensor to prevent over-mixing, a low-volume detergent delivering tool, and a drain tank. PSC-101 uses its intuitive touch-screen interface to make graphics-driven programming simple and straightforward. This feature allows users to quickly set the coating parameters and establish the desired layer thickness profile. It can also be used to record and store pre-programmed processing recipes for repeat methods. PSC 101 enables quick and efficient photoresist coating and development with two independent sources for each chamber, including a medium and high-speed spin process for faster delivery. The easy to access front cover offers convenience when changing wafers. SEMITOOL PSC-101 also offers advanced features specifically designed for mask alignment and lithography accuracy. The patented MaskMaster optical alignment asset allows for sub-micron, on-the-fly alignment for faster and more accurate alignment of the wafers. The left and right print head offers a quick alignment time and improved reproducibility, while the dual emulsion spin model allows for simultaneous spin on one wafer. In summary, SEMITOOL PSC 101 is an advanced, reliable and cost-effective equipment that offers a wide range of features and capabilities to meet the needs of demanding industrial applications. It is a powerful automation system, designed to increase productivity and reduce the time required for the successful execution of processes such as photoresist coating and development.
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