Used SEMITOOL PSC-101 #9184611 for sale

SEMITOOL PSC-101 is a photoresist equipment designed for use in the semiconductor and optoelectronics industries. The system offers a high degree of accuracy with its multi-channel, modular photoresist thin-film deposition unit. It boasts a number of features designed to ensure accuracy and precision including an automated programmable pattern file generation, a temperature-controlled process chamber, higher resolution imaging capabilities and superior photoresist film formation. SEMITOOL PSC 101 utilizes precision photolithography technology to enable the photoresist film formation. This consists of a laser-based or ultraviolet (UV) light source to expose the photoresist material according to a mask pattern that has been generated and controlled by the included control software. PSC-101 features a multi-channel self-contained machine that provides uniform, accurate and repeatable photoresist deposition. This ensures that the photoresist layer can be fabricated onto a precise substrate surface without excessive variation within or across the entire substrate area. PSC 101's automated programmable pattern file generation offers a number of advantages. It adds additional flexibility when needed to quickly modify the pattern file without needing to manually program the pattern file each time. The tool includes a powerful, user-friendly control software that streamlines pattern file generation and editing to further minimize time and effort. At the heart of SEMITOOL PSC-101 is its temperature-controlled process chamber. This ensures that the temperature is accurately maintained from one run to the next, which helps to maintain consistent and reliable photoresist film formation. It also ensures a higher resolution imaging capability to ensure that patterns remain consistent within a single mask. SEMITOOL PSC 101 is designed to offer superior photoresist film-formation capabilities, such as rapid onset time and improved film adhesion, while still maintaining accuracy and precision. This results in a more robust photoresist layer, which can then be used for a number of device and optoelectronic applications. In summary, PSC-101 photoresist asset is a precision photolithography model with automated programmable pattern file generation, a temperature-controlled process chamber and superb photoresist film formation capabilities. It offers the accuracy and precision required for semiconductor and optoelectronics applications.