Used TEL / TOKYO ELECTRON Clean Track Mark 7 #160121 for sale

TEL / TOKYO ELECTRON Clean Track Mark 7 is a photoresist equipment that offers superior cleanliness and high productivity. This system is designed especially for photolithography and etching processes. It uses a special software and a powerful laser to accurately create precise photo masks for precise and controlled exposure of photo resists. This unit is ideal for finer feature sizes and high accuracy applications. TEL Clean Track Mark 7 uses a water-soluble stop layer on the surface and then a high-precision laser to form the photo mask. The laser beam is used to accurately create openings of the desired size and shape onto a photosensitive material. This technology allows for feature sizes from 50nm to 100nm and tight tolerance feature accuracy. The machine also has high frequency and uniformity of etch rates for thick resists or multiple photo resists. TOKYO ELECTRON Clean Track Mark 7 has an advanced controller that monitors the quality of the photo mask formation and provides feedback, allowing for precise and automatic mask development. The controller also has a quality assurance function that notifies the user if any error is detected. This allows for quick and accurate corrective action. The tool is highly reliable and able to run continuously with no interruption. It also has an automated cleaning cycle that regularly cleans the photo mask and prevents buildup of residues which can ultimately prevent optimal performance. The asset also has low power consumption and has low substrate damage. In conclusion, Clean Track Mark 7 is a precision photoresist model designed for photolithography and etching processes. The equipment has an advanced controller that monitors the quality of the photo mask formation and provides feedback for optimal programming. It has high frequency and uniformity of etch rates for thick resists or multiple photo resists. The system also has an automated cleaning cycle and low power consumption. All of these features make this photoresist unit ideal for delicate or high accuracy applications.