Used TEL / TOKYO ELECTRON Lithius #199676 for sale
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ID: 199676
Wafer Size: 8"
Vintage: 2005
Track System, 8"
12" System converted to 8"
COT 1:
Resist nozzle: (5) nozzles with RRC
Resist supply: auto bottle switching system / nozzle
Solvent supply: CCS + back up canister
COT 2:
Resist nozzle: (5) nozzles with RRC
Resist supply: branch from COT1
Solvent supply: branch from COT1
BCT 1:
Resist nozzle: (3) nozzles with RRC
Resist supply: auto bottle switching system / nozzle
Solvent supply: branch from COT1
BCT 2:
Resist nozzle: (3) nozzles with RRC
Resist supply: branch from BCT1
Solvent supply: branch from COT1
DEV 1:
DEV nozzle: NLD nozzle
FIRM nozzle
DEV supply: CSS
FIRM supply: CSS
DEV 2, 3, 4, 5:
DEV nozzle: NLD nozzle
FIRM nozzle
DEV supply: branch from DEV1
FIRM supply: branch from DEV1
2005 vintage.
TEL / TOKYO ELECTRON Lithius is a photoresist equipment used for a variety of lithographic processing applications. It enables the deposition of thin films, as well as the patterning of thin film layers, on semiconductor substrates such as silicon wafers. Photoresist is an optically sensitive material used to create patterns during the lithography process. TEL Lithius was designed to provide a reliable, high-precision, and efficient lithography system for processing integrated circuits. The unit uses a complex series of light sources, light modulating components, and masks (defined patterns of light) that are quickly positioned and manipulated in space. The machine also features advanced optics for maximized image resolution and accuracy. The main components of TOKYO ELECTRON Lithius tool are the exposure unit, scan manipulator, autoloader, and leveler. The exposure unit houses the optical components that project the mask image onto the photoresist surface. The scan manipulator is a mechanical device used to precisely position the mask and can move up to four positions with sub-micron accuracy. The autoloader is the component that handles loading and unloading of the masks, and the leveler enables fine adjustment of the mask's position relative to the photoresist surface. The most important component of the asset is the photoresist itself. Photoresist is an organic compound which, upon exposure to light, undergoes a photocatalytic reaction to form a polymer. The polymer layer can then serve as a protective layer against etching and other processes. In addition, photoresists are designed to be very sensitive, allowing for very high resolution of patterns transferred to the photoresist surface. During the lithography process, the photoresist is first applied to the substrate and the mask is positioned over the photoresist using the scan manipulator. As the mask is moved, the exposure unit projects the mask image onto the photoresist. Once the exposure is complete, the photoresist is exposed to a developer solution that removes the exposed photoresist, leaving behind a patterned layer. This patterned surface can then be etched, metallized, or manipulated in other ways, such as photolithography processes like doping. Lithius model provides an easy to use, accurate, and reliable platform for lithography processing. With its advanced optics, precise scan manipulator, and automated mask loading and unloading, the equipment can quickly and accurately create detailed patterns on photoresist surfaces. By offering users reliable and cost-effective lithographic capabilities, TEL / TOKYO ELECTRON Lithius is an ideal solution for integrated circuit processing.
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