Used VERTEQ 1600-44 #5954 for sale

VERTEQ 1600-44 is an advanced photoresist equipment designed for the development and manufacture of integrated circuits and other advanced application requirements. It is an advanced weapon in the tool-building armamentarium, as it offers a high level of fine-grained control when creating and processing photoresist layers on wafer substrates. 1600-44 is a fully automated system capable of creating high quality photoresist layers on substrates with thicknesses ranging from 0.1 um (micron) to 250 um. The unit consists of a special photoresist dispenser machine, pre-treatment and exposure systems, and spin-coater assembly. This tool allows for a fast and efficient process of wafer processing and handling. The pre-treatment asset prepares the wafer substrate with a special surfactant/cleaning solution, followed by a spin-coater assembly which coats the wafer substrate with the photoresist solution. A variety of exposure techniques are employed for the photoresist layer such as interferometry, stepper alignment, and laser lithography. The exposure model of VERTEQ 1600-44 is capable of controlling light intensity and interferometry with high precision. 1600-44's post-exposure equipment allows for rapid photoresist development. The photoresist which is coated on the wafer substrate is chemically treated and developed via a variety of unique post exposure processes including light exposure and dry etching processes. This facilitates the process of creating intricate patterns and design elements on the wafer substrate. VERTEQ 1600-44 also includes a range of process control system options, allowing for precise monitoring and analytics at every step of the photoresist process. The optical, environmental and kinetic parameters can be monitored and adjusted to optimize the unit's performance. The combination of advanced automation, precise monitoring and analytics, and high quality photoresist layers make 1600-44 machine a powerful asset in the production of integrated circuits and other photolithographic applications.