Used JIPELEC Jetfirst #9182654 for sale

JIPELEC Jetfirst is a leading thermal processing equipment that is designed to meet the needs of a wide range of applications. This system offers rapid thermal processing of wafers, substrates, and devices. The unit offers the user a combination of advanced technology, extreme precision, and high throughput that makes this machine an ideal choice for rapid thermal processing of components. Jetfirst is equipped with two parallel high vacuum process chambers, each with a five inch capacity. Each of the two chambers has an independent control panel and multiple parameter settings, which enable users to quickly and accurately tune the process parameters to meet the specific process requirements. Additionally, the two chambers have a dedicated oven zone in each chamber. JIPELEC Jetfirst also features an advanced optics tool, featuring an advanced optical microscope, capable of providing a full field of view for inspecting and characterizing thermal processes on wafers and substrates. The microscope also has a zoom capability for increased resolution and more precise thermal measurements. Jetfirst also features an adjustable atmosphere chamber to improve the thermal uniformity across the wafers and substrates. This feature allows for increased accuracy when characterizing the thermal processes on the wafers and substrates. JIPELEC Jetfirst includes several features to ensure optimal process uniformity and consistency. The asset has a patented automation model that allows for precise control of the process parameters and provides a reliable operating environment. Additionally, Jetfirst features several thermal insulation systems to ensure a uniform temperature distribution across the wafers and substrates. JIPELEC Jetfirst provides a reliable thermal process environment, as well as easy access and versatile control options for varied applications. The equipment can be programmed to handle a variety of tasks such as thin film deposition, rapid thermal annealing, and semiconductor device fabrication. Moreover, Jetfirst is capable of running multiple processes in parallel, thus increasing the overall throughput capacity of the system. All of the features offered by JIPELEC Jetfirst make it an ideal choice for high speed thermal processing of wafers, substrates, and devices. It makes the technical process of thermal conditions much easier and faster than conventional methods, making this unit an excellent choice for a variety of applications.