Used STEAG / MATTSON / AST Helios #9084734 for sale
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ID: 9084734
Wafer Size: 12"
Vintage: 2005
RTP system,12",
Currently shrink wrapped and warehoused
Process Chambers:12" (3x FOUP)
Carrier ID reader (Hermos RF CID)
SECS/GEM
MBC soak anneal controller
Low temperature option including Low
Temp MBC
Fast cooling option (FAC and USJF)
Low concentration processing kit
Over pressure control
Gasses
N2 20 SLM
N2 150 sccm
O2 150 sccm
O2 20 SLM
O2 2 SLM
Ar 150 sccm
Ar 20 SLM
O2 200 sccmo APF Faceplate
2005 vintage.
STEAG / MATTSON / AST Helios is a rapid thermal processor (RTP) manufactured by AST MATTOSN, a global leader in thermal processing technologies. It is a versatile equipment capable of providing a wide range of thermal processing applications including thin film deposition, annealing, and rapid thermal oxidization (RTO). The system is comprised of a horizontally mounted susceptor attached to an automated high temperature chamber. The susceptor is capable of reaching temperatures of up to 950 degrees Celsius and is designed for repeatability with high temperature accuracy. The surrounding chamber is designed for uniform heating of the susceptor using halogen lamps and quartz air heating. The chamber also features an automated door for loading and unloading of wafers, as well as an isolated exhaust port to vent process gases. The unit is typically configured with one or two quartz lamps and one halogen lamp. It can operate in continuous, single-batch, automated, and semi-automated modes. The wafers are loaded into the chamber via an automated multi-level transfer mechanism. The machine is also equipped with a PID temperature controller to ensure uniformity and repeatability. The tool is capable of processing a variety of wafer sizes and substrates, including silicon, gallium arsenide, and sapphire. It is capable of thinning up to 6 microns, annealing 70 to 1000 ohms/sq, and rapid thermal oxidizing up to 100 degrees Celsius at 70 to 150 nanometers per minute. The asset also features premium process leakage and longterm cycle stability for repeatable, reliable results. Overall, AST Helios is an excellent choice for a wide range of thermal processing requirements. Whether depositing thin films or rapidly oxidizing wafers, the model can provide repeatable and reproducible results. With its robust construction and automated features, it is an optimal choice for effectively and efficiently processing your parts.
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