Used AIXTRON AIX 2400 G3 #9194776 for sale
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ID: 9194776
Vintage: 1999
InP Reactor
11x2”
(2) AsH3
PH3
SiH4
H2Se
(2) CCl4
HCl
(2) TMGa
(3) TMIn (2 with Epison III)
TMAl
DEZn
(2) H2 Pd cell purifiers
NESLAB Chiller
1999 vintage.
AIXTRON AIX 2400 G3 is a high-performance closed-field metal-organic chemical vapor deposition (MOCVD) reactor designed to meet the needs of various demanding industrial materials and device research application areas. This state-of-the-art reactor is a versatile equipment offering reactive gas flows in a sealed quartz tube environment, enabling extremely high growth rate and quality for a broad range of materials such as GaAs, GaN, InGaN, AlGaAs, InGaAs, AlGaN, GaP, InP, and others. AIXTRON AIX 2400 G 3 features a robust substrate heating system that ensures precise temperature control across a range of growth temperatures from room temperature to 1,100°C. Its proprietary wafer-flip technology dramatically improves uniformity performance and throughput, providing both single- and multi-wafer processing capabilities. In addition, a seven-zone crucible unit enables efficient and precise process control for even the most complex materials. AIX 2400 G3 also offers superior reliability and performance thanks to its state-of-the-art chamber design. Its high-efficiency plasma source delivers superior performance for all reactive gas species, while its mobile masses and ceramic gaskets provide excellent long-term chamber stability. Furthermore, AIX 2400 G 3 features advanced safety features including automated process parameter monitoring and emergency interlocks. This advanced reactor also provides an ideal platform for growth of wide-bandgap semiconductors such as gallium nitride (GaN) and aluminum gallium nitride (AlGaN). With the latest advances in its patented wafer-flip technology, AIXTRON AIX 2400 G3 provides high-quality, uniform GaN and AlGaN growth. Furthermore, its plasma source, seven-zone crucible machine, and deposition tool enable precise control of reactants, temperature, and pressure for high-end optical, electronic, and optoelectronic device fabrication. AIXTRON AIX 2400 G 3 affords users the highest levels of performance, reliability, and control, making it an ideal choice for high-end materials and device research in a multitude of industries.
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