Used AIXTRON 2800 G4 HT #9195750 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

Manufacturer
AIXTRON
Model
2800 G4 HT
ID: 9195750
Vintage: 2007
MOCVD System 42"x 2", (6) Satellite Loaded for each run: 7"x 2" per satellite Gas lines: 3 NH3, 1 SiH4 LAUDA: RM 25 S/G, RM 6 S/K EPISON4 Installed MO Lines: TMG TMA (2) Cp2Mg (2) Indium (2) TEG MO Materials: TMG TMA Mg In TEG SiH4 NH3 Measure the reflectance & temperature: EPITUNE III Process pump: EBARA A25 WKL230 Chiller included External scrubber HORIBA STEC HITEC Gas: GaN 2007 vintage.
AIXTRON 2800 G4 HT is a reactive deposition tool designed for the rapid and efficient production of high-performance optoelectronic components and devices. It is a compact, 3-axis homogeneous transverse (HT) equipment based on a 4-inch or 8-inch bridge structure, featuring 32 crucibles, 4 magnetic fields, and 4 proximity coils. This sophisticated deposition system offers excellent uniformity and stability across all precursors, making it an ideal tool for producing high-quality samples. AIXTRON 2800G4 HT's advanced design makes it ideal for deposition of ultra-thin layers. The unit is able to achieve very low thicknesses of thin-film layers during deposition processes and can deposit layers as thin as few tens of nanometers (nm). This thin-film deposition process is also capable of forming single and multi-layer heterostructures with strong layer-to-layer interface properties. The advanced computer-controlled systems employed in 2800 G4 HT are capable of controlling up to 32 sources simultaneously and also provides temperature ramping up to 1300°C with a resolution of 0.1K. This helps to ensure high-precision control and accuracy over the deposition processes. The onboard software also includes a range of advanced programs that are able to simulate and optimize deposition processes as well as help to monitor progress and optimize configuration. The design of the machine is further enhanced by the magnetic field included in the reactor. This auto-adjusting magnetic field helps to prevent any surface contamination and provide enhanced control over the particle distribution within the chamber. The proximity coils also reduce the total deposition time and maximize the substrate throughput by providing both uniform heating and cooling of the substrate. Overall, 2800G4 HT is a versatile resistance deposition tool capable of delivering high-precision optoelectronic components and devices. By combining its advanced design features, computer control, and excellent layer-to-layer uniformity, AIXTRON 2800 G4 HT is an ideal tool for efficient and uniform deposition processes.
There are no reviews yet