Used AIXTRON Crius 31x2" #9186411 for sale

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Manufacturer
AIXTRON
Model
Crius 31x2"
ID: 9186411
Vintage: 2009
MOCVD System 2009 vintage.
AIXTRON Crius 31x2 is a high-tech chemical vapor deposition (CVD) reactor designed for ultra-high throughput deposition and surface conditioning of materials. Featuring a large 2.5" diameter heated zone, the 31x2 offers superior temperature uniformity and uniform heat distribution of films and heterogeneous surfaces. This makes the reactor ideal for surface modification for advanced materials such as graphene and nanowire composites. The Crius 31x2 utilizes an efficient, low-temperature plasma-assisted CVD (PA-CVD) process, which enables the deposition of metal and metal oxide films under efficient, low pressure and temperature regimes. This process has exhibited enhanced efficiency, exceptional uniformity of film thickness, and controllable and reproducible surfaces. An additional advantage of the Crius 31x2 is the high throughput of the process compared to other traditional thermal deposition processes. By using plasma, the reactor is capable of depositing films 3 to 5 times faster than thermal processes. The Crius 31x2 reactor features a rapid thermal annealer (RTA) for surface conditioning of materials. The RTA is integrated into the chamber to perform rapid thermal annealing over a wide range of temperatures. This allows for improved surface activation of materials, removal of contaminants, and enabling of surface restructuring. The RTA is also capable of performing post-deposition thermal treatments. The 31x2 is also equipped with independent gas injection systems for precise, uniform control of gas flows. This allows the process gasses to be closely monitored and closely controlled, providing users with high level control of the CVD reactions. The convenience of this feature ensures that the conditions and parameters of the deposition process can be adjusted carefully and with accuracy to produce desired products and materials. The Crius 31x2 also offers a specialized catalytic plasma ashing system, along with a specialized, high temperature cooled crucible designed to support ultra-high deposition rates. This system is fully-digital, with a simplified user interface for easy control and operation. AIXTRON Crius 31x2 is a powerful, intuitive, and efficient CVD process customized for the deposition of advanced materials. Its unique features and technologies boast improved throughput, uniformity, and reproducibility, allowing for improved material surface quality.
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