Used AIXTRON Crius I #9188566 for sale

AIXTRON Crius I
Manufacturer
AIXTRON
Model
Crius I
ID: 9188566
Epi reactors 31x2" GaN.
AIXTRON Crius I is an advanced epitaxial reactor, designed for use in the development and manfacturing of semiconductor and optoelectronic devices. This reactor utilizes AIXTRON flagship metal-organic chemical vapor deposition (MOCVD) technology, which has been refined for over two decades. Crius I is a single-wafer, batch-process tool, designed for high throughput and easy scalability. AIXTRON Crius I is a vertical, multi-tube reactor with a maximum tube rotation speed of 12,000rpm and a fourteen-position cassette loading and unloading station. The reaction chamber is equipped with AIXTRON Signature Low Vibration Beam (SLV Beam) with a 13° bevel. This provides a homogenous and fine surface finish to the wafers being processed, allowing significantly lower dished wafer edges. Additionally, Crius I features a hot-wall susceptor, able to operate at temperatures of up to 1100°C with exceptional control and accuracy. AIXTRON Crius I is an expandable system capable of a wide range of process chemistries and dopant gas chemistries. It is able to accommodate both low- and high-volume production, and offers both stand-alone and cluster configurations. The FlexMode allows customers to quickly modify the tool reactor chamber parameters between two programs, making intermediate changes to the process recipe without having to perform lengthy interventions. Crius I uses proprietary process control software (Turbo SoftTune), enabling simplified, menu-driven operation. Intelligent Adaptive Control (IAC) raises this further, with active parameter detection and modification designed to hone in on the right operating parameters for a given application. It can also be retro-fitted with AIXTRON furnace technology, allowing vertical integration of crystal growth and device manufacture. In summary, AIXTRON Crius I epitaxial reactor is an advanced resource for the development and manufacture of semiconductor and optoelectronic devices. It offers a high throughput, low vibration beam, and hot-wall susceptor technology, enabling intricate control for delicate processes. An advanced process control system, expandable architecture, and flexible mode of operation make this a reliable and family resource.
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