Used AMAT / APPLIED MATERIALS Centura 5200 DxZ #9091401 for sale

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ID: 9091401
Wafer Size: 8"
Vintage: 1997
ILD System, 8" Mainframe: Centura 5200 Transfer chamber: Centura 5200 (2) Loadlock chambers: narrow body (4) Process chambers: DxZ Robot: HP+ Loading configuration: narrow body dual auto-indexer loader System controller / AC power box (2) CRT monitors with light pen RF generator rack Heat exchanger: AMAT 0 Chamber A: DxZ Chamber B: DxZ Chamber C: DxZ Chamber D: DxZ Chamber E: MS Cool Gases: TEOS, O2, NF2, N2 Software version: E3.0 208VAC, 3 Phase 1996 vintage.
AMAT / APPLIED MATERIALS Centura 5200 DxZ is a next-generation plasma-enhanced chemical vapor deposition (PECVD) reactor that is designed to deposit advanced material layers on substrates for integrated circuit (IC) fabrication. The PECVD process is a means of imparting deposited films that are uniform in thickness and are free from defects. AMAT Centura 5200 DxZ is equipped with a number of features that enhance its performance and enable a wide range of process capabilities. It has dual chambers with an independent power supply for each chamber, allowing the installation of up to two films concurrently. APPLIED MATERIALS Centura 5200 DxZ also benefits from a radial temperature profiler, a variable RF bias, and an advanced pumping system with multiple vacuum levels. The reactor is based on a high-throughput, low-cost manufacturing platform, which is enhanced by AMAT proprietary Simul-ProcessTM technology. This technology combines experimental and numerical optimization techniques in order to ensure high-quality films and optimal deposition rates. Centura 5200 DxZ delivers consistent and reliable results in a wide range of processes, including low- and high-k dielectric deposition, thin-film encapsulation, sidewall profiling, source/drain engineering, and shallow trench isolation. Further, its advanced chamber design prevents the deposition of metal contamination and prevents particles from entering the vacuum chamber, which could otherwise result in disturbances and defects to the deposited films. APPLIED MATERIALS also offers a range of process options, as well as the capability to perform multiple processes simultaneously. These features enable users to take advantage of its enhanced throughput and reduce total processing time. Additionally, the system is designed to consume less power than its predecessors, making it an environmentally responsible choice and more energy efficient. Further, AMAT / APPLIED MATERIALS provides tools to monitor system performance and optimize processes, which extends equipment life and lowers the cost of ownership. Overall, AMAT / APPLIED MATERIALS Centura 5200 DxZ is an advanced, efficient, and economical PECVD reactor designed to meet the industry's most exacting substrate requirements. It offers excellent performance, versatility, and productivity in a range of process options, ensuring optimal results for depositing advanced films for integrated circuit (IC) fabrication.
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