Used AMAT / APPLIED MATERIALS Centura 5200 #9186584 for sale
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ID: 9186584
RTP System, 8"
Specifications:
Connection: Delta
Mainframe: Centura I
Ch. configuration:
Ch A: RTP Mod 1
Ch B: RTP Mod 1
Ch C: No
Ch D: No
Ch E: No
Ch F: Single slot cool down
Robot(HP): HP
Robot blade (Reduce contact): Quartz
LL (Wide with tilt-out): Narrow body, tilt-out
LL Slit valve (Chemraz): Chemraz O-ring
Signal cable: 25ft
Heat exchanger: No
VME
Controller and system AC Rack
Gas panel:
Gas feeding: Top feed SLD
Gas 1: N2 20slm, STEC 4500
Gas 2: O2 10slm, STEC 4500
Gas 3: N2 20slm, STEC 4500
Gas 4: O2 10slm, STEC 4500
Process chamber: Mod 1
Bottom purge: No
Manometer: 1000 torr/Single
Ch Gas feed: Single feed
Butterfly throttle valve: 1/chamber
Wall cooling: PCW Cooled wall
Chamber clamp: Clamp with bolt
SiC Coated process kit: None
Lamp controller: Luxtron 100C
Power requirements: 208V, 550A, 60Hz
1996 vintage.
AMAT (APPLIED MATERIALS) AMAT / APPLIED MATERIALS Centura 5200 is a high-performance Chemical Vapor Deposition (CVD) reactor.The equipment is used to form thin films on semiconductors and other surfaces by depositing a vapor containing the desired film material onto the surface.The purpose of the system is to deposit an ultra-fine uniform thin film which can be used in a variety of electronic and optoelectronic applications. AMAT Centura 5200 reactor is constructed with a quartz tube design and is capable of processing both single and multiple wafer modules. It features a user-friendly GUI based unit that enables users to easily set process parameters such as temperature, pressure, and flow rate. The machine also features two independent heating zones that can be used to support different temperature profiles and process regimes. The temperature must be carefully monitored and maintained in order to ensure optimal deposition results. The unit is fitted with an advanced gas delivery tool for precise process gas flow management. This ensures accurate and repeatable process results. The asset is capable of processing a wide range of materials including silicon, germanium, gallium nitride, sapphire, silicon carbide, and diamond. APPLIED MATERIALS Centura 5200 is designed to support deposition of high-quality films with excellent reproducibility. The model is also equipped with self-diagnostic and monitoring capabilities to help ensure reliable and safe operation. This includes automatic shutoff of process flows and temperature control if preset conditions are not met. The temperature, pressure and shelf temperature of the equipment can all be monitored in real-time with a computer system. This provides users with important feedback to ensure optimal process operations. The unit is also capable of offering Advanced Sub-Micron Photolithography (ASMP) capabilities. Ultra-precise mask alignment and lithography can be carried out to form intricate features and structures with excellent resolution with minimal distortion. The machine can also be configured to support multiple techniques such as spin coating, etching, and ion implantation. Centura 5200 is a reliable and versatile reactor that provides users with excellent deposition capabilities for a range of applications. It is robustly designed for reliable long-term use and offers advanced monitoring and control of the process parameters to ensure consistent and repeatable results.
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