Used AMAT / APPLIED MATERIALS Centura I DPS+ #159104 for sale
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ID: 159104
Poly etcher, 8"
Chamber Type
CH.A DPS Poly
CH.B DPS Poly
CH.C DPS Poly
CH.D
CH.E
CH.F Oriental
Robot type: HP
Process kit: 200MM JMF Process Kit
Chuck Type: C-ESC
Loadlock: Heated narrow body
Turbo Pump: SEIKO SEIKI STP-A2203PV )
RF Generator:
Source: AE RF5S
Bias: RFPP RF5S
RF Match: Match (P/N 0010-36408)
EPD: Monochrometer
Computer: CRT Monitor 3ea
Gas:
Gas panel: Seliplex gas panel
MFC: Aera FC-D980C
Gas Configuration:
Chamber A Chamber B Chamber C
Gas Size Gas Size Gas Size
Line 1 Cl2 50 Cl2 50 Cl2 50
Line 2 Cl2 200 Cl2 200 Cl2 200
Line 3 HBr 200 HBr 200 HBr 200
Line 4 O2 10 O2 10 O2 10
Line 5 O2 500 O2 500 O2 500
Line 6 N2 10 N2 10 N2 10
Line 7 CF4 100 CF4 100 CF4 100
Line 8 SF6 50 SF6 50 SF6 50
Line 9 Ar 200 Ar 200 Ar 200
2001 vintage.
AMAT / APPLIED MATERIALS Centura I DPS+ Reactor is a revolutionary device designed to provide high quality semiconductor deposition and etching solutions at an all-in-one facility. This equipment is capable of achieving exceptionally accurate and precise film deposition and etching processes, enabling users to produce the highest quality semiconductors in the industry. AMAT Centura I DPS+ Reactor is an automated system featuring an industry-leading platform that incorporates advanced technologies including precise temperature and pressure monitoring, dynamic wafer manipulation, and abundant plasma sources for etching and deposition. The reactor can be easily configured to accommodate a variety of reactions, making it beneficial for many users in the semiconductor industry. APPLIED MATERIALS Centura I DPS+ Reactor features an advanced gas delivery unit that allows users to achieve incredible levels of accuracy. The machine features active control of deposition and etching conditions, providing precise control of temperature, pressure, and cell parameters. The unit also employs an effective plasma source for etching and deposition, allowing for precise control over the reactivity and deposition rate. The tool additionally integrates flexible wafer manipulation, giving it the capability to handle processes such as laser ablation, edge bevel processing, conformance testing, and more. The reactor's advanced optics and automation capabilities extend far beyond its gas delivery and plasma source functions. Centura I DPS+ Reactor offers users incredible levels of automation, with features such as automated recipe optimization, integrated furnace-level control, and complete remote web-based access. Thanks to the integration of the Centura Network with the reactor, users can take advantage of powerful process analysis and automation capabilities. This integration allows for precision data collection and analysis, allowing users to identify and optimize undesirable trends, resulting in improved process results. AMAT / APPLIED MATERIALS Centura I DPS+ Reactor is a highly advanced reactive deposition and etching asset that can be easily integrated into a variety of semiconductor fabrication processes. Thanks to its highly automated and precise model components, users of this reactor can achieve consistent results and reduce their manufacturing cycle time while improving quality. AMAT Centura I DPS+ Reactor is an ideal choice for the discerning semiconductor fabrication engineer, providing an advanced platform that is capable of exceptional performance.
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