Used AMAT / APPLIED MATERIALS Centura WCVD #9169932 for sale

AMAT / APPLIED MATERIALS Centura WCVD (Wet Chemical Vapor Deposition) reactor is a specialized production-grade tool used in a variety of advanced material growth applications. AMAT Centura WCVD reactor equipment is capable of achieving a wide range of high-quality films at high throughput rates. The system combines a wet chemical reactant source, a hot wall tube furnace, a cooled reaction chamber, an efficient heat transfer unit, and high accuracy temperature feedback control. The wet chemical reactant source is designed for precise and stable chemical vapor deposition. The reactant gases, either a halide or elemental, are delivered through an internal gas feed machine and then passed through a bubbler to produce a controlled range of nucleation density. The bubbler has a replaceable inert heater which allows for the temperature of the bubbler to be set to a desired range, resulting in a precisely controlled flow of reactant gases. The hot wall furnace used in APPLIED MATERIALS CENTURA WCVD provides for a highly efficient and reliable heat input. It uses a strong molybdenum (Mo) crucible to provide uniform heat distribution, and a high emissivity Mo heat shield to protect the reaction chamber from heat dissipation. Together, these components ensure the required temperature levels are maintained throughout the furnace. The cooled reaction chamber aids in controlling film deposition temperature by providing a stable and thermally insulated environment. It is made of high-grade cladded sheet metal that provides excellent thermal insulation and a leak-free airtight vacuum seal. Additionally, it is equipped with high-efficiency vapor removal ports which help remove excess reactant gases and reduce deposition temperatures. The heat transfer tool of Centura WCVD is designed for fast and efficient film deposition. It uses a continuous hot wall heating element for maximum heat transfer potential, as well as a robust thermoelectric cooler for eliminating static heat load. Its dual-zone control ensures uniform temperature distribution throughout the asset, aiding in the creation of consistent film quality and eliminating the need for excessive thermal cycling. Finally, AMAT / APPLIED MATERIALS CENTURA WCVD features a high accuracy temperature feedback control model. This advanced control equipment allows for real-time control over film deposition, optimizing process parameters and ensuring high film quality. Combined with its efficient heat transfer system, APPLIED MATERIALS Centura WCVD delivers excellent thin-film deposition productivity.