Used AMAT / APPLIED MATERIALS Endura 5500 #9188357 for sale

AMAT / APPLIED MATERIALS / AKT Endura 5500 Reactor is a high-performance reactive ion etching (RIE) tool designed for use in the fabrication of semiconductor device layers. This equipment is used in the manufacturing process to create intricate patterns on wafers, enabling manufacturing of complex multi-layer devices. The tool features an advanced plasma source that is capable of achieving ultra-high plasma densities, allowing for the etching of extremely fine features. A wide range of materials can be etched, including silicon dioxide, silicon nitride, and other high-k dielectrics. AKT Endura 5500 Reactor has a vacuum chamber with a low-pressure reaction chamber integrated within it. This easily accessible chamber measures 25.4 x 25.4 x 75 cm, allowing for the etching of large wafers (up to 35.3 cm). It is equipped with a unique wheel-in and wheel-out mechanic that allows users to quickly switch between different etch processes. This system's modular architecture makes it suitable for multiple uses, including resist stripping, high aspect ratio (HAR) profiling, dry etching, and sputtering. AMAT ENDURA 5500 utilizes a revolutionary plasma generation approach with high-power RF and DC sources and a Quadrupole Mass Spectrometer which allows for the monitoring of reaction gas combinations and other processes. This unit has a process pressure capability of up to 5 mTorr, along with a temperature range of up to 400°C. Furthermore, it utilizes several features that ensure precise etching, including automated wafer recognition, an intuitive user interface, and a real-time Pressure Monitor. AMAT / APPLIED MATERIALS / AKT ENDURA 5500 Reactor is built for high throughput of high-performance applications, providing reliable etching throughput at high yields. The machine includes a wide range of advanced features, allowing for precise control over etch process parameters. All of these features enable users to produce high-quality devices with a much lower defect rate. The Reactor's easy-to-use user interface ensures that fabrication engineers can quickly and easily set up and optimize etch recipes for their specific needs.