Used AMAT / APPLIED MATERIALS P5000 #9051354 for sale
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ID: 9051354
Wafer Size: 6"
Vintage: 1991
CVD system, 6"
(2) Chambers
Vacuum processing type
Wafer type: Notch
MFC:
Gas #1: N2 1 slm
Gas #2: C2F6 1 slm
Gas #3: HE 1 slm
Gas #4: N2 1 slm
Gas #5: N2 1 slm
Gas #6: N2 1 slm
Gas #7: N2 3 slm
Gas #8: HE 1 slm
Gauge:
MKS 122BA Baratron, 100 torr
MKS 626A Baratron, 100 pa
Includes:
(2) AD Tec generators AX-1000 II
(2) AMAT Matchers
AC Rack
Gas box
(2) Chemical boxes
DEFENSA UPS1010
Heat exchanger
FUJI ELECTRIC Transformer
Main frame
1991 vintage.
AMAT / APPLIED MATERIALS P5000 is a high-precision, high-performance, single-wafer thermal processing reactor. It is designed for batch processes in semiconductor, MEMS, and other advanced materials industries. The accuracy, throughput, and precision of AMAT P-5000 in producing integrated components make it a powerful, cost-effective tool for producing crystal wafers and semiconductor materials. The reactor is made up of two main components: the process chamber and the pressure chamber. The process chamber has a rotating susceptor for homogeneous heating and cooling, as well as a gas injector for precise gas regulation. The pressure chamber houses the pressure regulator and a 300 millibar gas delivery equipment. The gas delivery system is designed to provide extremely precise regulation of process gases and temperature while maintaining low pressure stability. APPLIED MATERIALS P 5000 reactor is also equipped with a patented flameouts unit. This machine measures process parameters and provides advanced feedback control and diagnostics. This tool helps to protect against process instability and ensure optimal process performance. AMAT / APPLIED MATERIALS P-5000 reactor is able to process a variety of materials, including gallium arsenide, quartz, gallium nitride, silicon carbide, and III-V compounds. Processes are designed to achieve high temperature, rapid cooling, and process pressures ranging from one mbar to 900 mbar. Additionally, AMAT / APPLIED MATERIALS P 5000 features plasma-enhanced chemical vapor deposition, atomic layer deposition, and nanoscale patterning technologies to produce highly integrated components. In terms of safety and reliability, P 5000 reactor sets the standard. It is designed with a complete safety asset including a pressure monitor, a vacuum lock valve, a hydrogen flow valve, and a high-pressure exhaust leak detector. The reactor also features a dual-track single-step process controller and a temperature control safety shutoff model to ensure process stability. Ultimately, APPLIED MATERIALS P5000 reactor is an advanced, reliable, and cost-effective tool for producing crystal wafers and semiconductor materials. Its accuracy, throughput, and precision combine to make it a highly valuable tool for design engineers and manufacturing professionals alike.
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