Used FEI / MICRION Vertra vision #9145593 for sale

ID: 9145593
Particle beam system I-Gun type: 5nm column next gen Beam current: 3pA~931pA (50KV) Depo system: Tungsten Tmcts O2 H2O Cl2 (or Br2) XeF2 Vacuum type: Turbo molecular pump (2) Mechanical pumps (2) Ion getter pumps Stage type: OBIC Laser 200 x 200 mm Loadlock type: Loadlock system PS / OS: IBM RISC System 6000 43P Model 150 computer AIX 4.3 Detector: MCP Others: FIB Assist(Version 0.9).
FEI / MICRION Vertra vision is a multi-purpose ion milling equipment developed for users of all levels. It is designed to provide maximum flexibility for surface preparation, disc preparation, milling thickness and trough-etching applications. The system enables the user to obtain high-precision, reliable and reproducible results. FEI Vertra vision unit consists of a series of gas-sensing and ionization cells connected to a vacuum chamber, ion source and beam line. The machine enables precise, staggered substrate manipulation with a variety of ion beam intensities. Also, the beam steering function provides the user the ability to finely-tune the milling process parameters. The features of MICRION Vertra vision include precise beam focusing, low kV operation with very high current values and the ability to control the direction of the beam, as well as the milling speed and throughput. High-pressure gas sensors, micro-sampling capabilities, diaphragm valve for fine tuning of the process and contamination-resistant windows are also present. Additionally, the tool offers a blank table, motion motion control, an on-screen display of the scanning parameters and an external beam shutter for increased safety. Vertra vision provides excellent milling parameters and uniformity. It is ideal for thin-film deposition, semiconductor process applications, deposition of nano-particles and through-etching applications. The high temperature and pressure capability of the asset is also ideal for high-precision through-etching, and it is capable of optimized ion beam thinning and ion beam-driven etching thickness. It has even been demonstrated to facilitate the production of multi-layer structures. All in all, FEI / MICRION Vertra vision is an advanced, multi-purpose ion-milling solution that is ideal for various industrial and research applications. It offers a high level of accuracy and reliability, allowing the user to precisely control their milling process and produce reproducible results. The advanced features and functions of the model make it a great choice for demanding fabrication and process requirements.
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