Used AMAT / APPLIED MATERIALS ENDURA #9170733 for sale

AMAT / APPLIED MATERIALS ENDURA reactor is an advanced, versatile, high efficiency process chamber used for a variety of semiconductor processing applications. AMAT ENDURA reactor has a wide range of capabilities, including etching, deposition, oxidation, and other processing. The primary benefit of APPLIED MATERIALS ENDURA is the improved throughput and uniformity of the process. ENDURA chamber consists of a large cylindrical stainless steel vessel with a flat, uniform bottom plate. The walls of the vessel are lined with quartz or ceramic insulators. Inside the chamber, a multi-baffle system enables uniformity of process pressure, temperature, and process gases throughout. The various components of theEndura, including the power supplies, vacuum pumps, cooling systems, and gas delivery systems, are mounted on a platform that is part of the end cap. The cooling system for AMAT / APPLIED MATERIALS ENDURA uses liquid cooling, either water or a proprietary blend of glycol, that is circulated throughout the chamber walls and parts. This cooling system maintains the chamber's temperature and protects it from the high thermal loads that are generated during processing. In addition, the cooling helps maintain a more uniform thermal distribution to facilitate high process uniformity. A number of gases can be used in AMAT ENDURA reactor, including non-reactive process gases and biological components like silicon tetrachloride, nitrogen trifluoride, nitrogen dioxide, and ozone. Depending on the type of process being performed, multiple gases can be used simultaneously at different concentrations and pressures. The chamber is designed with a variety of ports which allow both the introduction and evacuation of gases. The power supplies and other components of APPLIED MATERIALS ENDURA are designed to minimize power consumption and minimize thermal stress. Its capacitively-coupled, RF generator design provides high-frequency power delivery for etching and deposition. The generator is rigidly mounted to the chamber, and the RF generator control is accessed from an electronic control panel, allowing for precise adjustment. ENDURA is an effective and versatile tool for a variety of semiconductor processing applications, providing an improved throughput, uniformity, and improved thermal management capabilities. It is also easy to operate and maintain, making it an ideal choice for use in semiconductor and other advanced fields.