Used AMAT / APPLIED MATERIALS ENDURA #9175665 for sale

AMAT / APPLIED MATERIALS ENDURA Equipment is a state-of-the-art deposition system used to thin film deposition in semiconductor production and advanced material research. The unit is engineered to provide superior performance and uptime providing flexibility and affordability. The machine description follows: AMAT ENDURA Tool utilizes high-performance deposition tools to achieve precise thin film deposition on a variety of substrates. Utilizing a variable pressure environment, the chamber provides precise thin film deposition control at a wide range of temperatures, making this asset ideal for wide range of process applications. The model is equipped with an efficient loadlock, a chamber containing multiple advanced deposition sources, pre and post-anneal systems, a gas box, and other advanced sub-systems. Depending on the application, sources may include an electron beam source, hot filament source, or direct-current plasma source and other specialty sources such as a flash lamp. Additionally, the equipment has a full array of advanced monitoring and control systems. APPLIED MATERIALS ENDURA system can be used in a variety of manufacturing processes, from advanced semiconductor production to the advancement of new and innovative materials. For semiconductor production, the thin film deposition can be used to process thin film transistors, spintronics and nanoelectronics, while in advanced material research the deposition can be used to create complex quantum devices and materials, such as graphene, carbon nanotube, and van der Waals assemblies. The materials and substrates used in these processes range from silicon and germanium based substrates to low k and high k dielectric thin films. The unit is capable of precise storage, heating, cooling and concentration control, making it ideal for advanced processes. Additionally, the machine is equipped with a comprehensive range of safety systems, helping to ensure reliable and secure operation. ENDURA Tool combines superior performance, precise thin film deposition and unprecedented flexibility, making it an ideal deposition platform for semiconductor and advanced material research. The asset is supported by a global network, offering support and resources to help ensure continuous uptime and on-going optimization.