Used AMAT / APPLIED MATERIALS ENDURA #9182274 for sale

ID: 9182274
Wafer Size: 12"
Chamber, 12" Process: PVD.
AMAT / APPLIED MATERIALS ENDURA is a multi-chamber process platform designed for advanced semiconductor research and development applications. It can be used for a wide range of process requirements, such as liftoff, patterning, doping, metrology, and epitaxial growth. AMAT ENDURA platform consists of a series of interconnected chambers that drive the deposition, etching and analysis of the materials being processed. APPLIED MATERIALS ENDURA platform is a high-density equipment which can process up to five wafers of different sizes at the same time. It is capable of high throughput and can run multiple deposits and etches in parallel. The model is equipped with high power RF and DC power sources, as well as rapid heating/ cooling mechanisms, to ensure maximum uniformity and control of the process. For deposition ENDURA platform can be configured to use either physical vapor deposition (PVD) or chemical vapor deposition (CVD). It is well-suited for thermal or low-pressure deposition techniques and offers excellent step coverage. The deposition process boasts high repeatability as well as good uniformity and adhesion. AMAT / APPLIED MATERIALS ENDURA's etching capabilities are based on plasma processing from a variety of gases. This ensures a high etch quality with low defectivity for a variety of applications. The model has integrated etching recipes for routine etching jobs, as well as a flexible etch rate control system for the most demanding tasks. It is also equipped with a closed-loop feedback unit -specialized computer programs that can automate the process and monitor the etch rates and end-point conditions. AMAT ENDURA machine is designed for metrological analysis as well. It has integrated shallow trench isolation (STI) metrology features which makes it great for developing and testing processes requiring tight control of film thickness. APPLIED MATERIALS ENDURA platform is a powerful tool for advanced semiconductor research and development. It is flexible and cost-effective, making it a wise investment for any laboratory or manufacturing facility. The machine can not only increase throughput, but also provide reproducible, high-quality results with excellent uniformity.
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