Used FSI / TEL / TOKYO ELECTRON Mercury #9073572 for sale

FSI MERCURY is a photoresist equipment used in the photolithography process for the manufacture of integrated circuits. It is a highly advanced resist technology used in the production of very small components, such as those found on current integrated circuits. Photolithography is a process used to transfer a patterned mask onto a semiconductor material. This technique uses light-sensitive chemicals to create very small patterns on the surface. MERCURY photoresist system is one of the most advanced resist technologies used in the production of microelectronic devices. FSI MERCURY photoresist unit is composed of two main materials; a photopolymerizable monomer and a photolinker. When the monomer goes through a pre-exposure stage and is exposed to UV light, it forms a photopolymerizable film on the substrate surface. This film is then linked by the photolinker to create a permanent image. The photorymerizable monomer contains a chemical structure that allows it to cross-link with the photolinker, which in turn creates a permanent pattern on the substrate surface. Once the photopolymerizable monomer is combined with the photolinker and the pattern is formed onto the substrate surface, MERCURY machine can then provide the highest possible layer-to-layer uniformity and imaging performance. This tool produces exceptional definition and provides excellent resolution and line fidelity for applications with very small structures. FSI MERCURY photoresist asset offers a very wide range of advantages, including very low coefficient of thermal expansion, practically zero viscosity, and a very low out gassing rate. It also provides high shelf life and fast exposure times. Furthermore, it offers very high adhesion and transparency levels and it has an exceptional ability to resist cracking and lifting. All of these attributes make MERCURY photoresist model the ideal choice for integrated circuit manufacturers. In conclusion, FSI MERCURY photoresist equipment provides a number of complementary qualities such as fast drying times, low coefficient of thermal expansion, excellent imaging definition, and a high level of layer-to-layer uniformity. All of these advantages make MERCURY photoresist system a highly advanced resist technology, and an indispensable tool for the production of integrated circuits.