Used FSI / TEL / TOKYO ELECTRON Mercury #9120351 for sale

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ID: 9120351
Wafer Size: 8"
PFA Turntable, 8".
FSI MERCURY is a photoresist equipment designed for the efficient lithography of highly miniaturized component features. The system is based on advanced DUV digital lithography technology and consists of an excimer laser illumination unit, a full optical imaging machine, a spin coater, and a spin dryer. The excimer laser illumination tool produces a short-wavelength exposure pattern which is used to create accurate, consistent patterns on photoresist-coated substrates. This asset can produce patterns with sub-micron resolution that can be used for highly complex, 3D components. MERCURY model's full optical imaging equipment provides even and precise illumination of the photoresist-coated wafer with more power and resolution than traditional light exposure systems. The integrated spin coater and spin dryer provide uniform spin coat and dry processes that enable production with optimal film thickness and precise surface homogeneity. This combination of high-tech components allows FSI MERCURY to create patterns with a higher number of pattern fidelity and a higher level of performance. MERCURY's photoresist system is capable of producing high-precision features with an acceptable defect rate, even on thin layers. Its design allows a wide range of materials to be used, from a variety of materials including metals, polymers, plastics and glass. A wide range of lithography applications can be supported with the unit, from contact to via holes to 3D patterns. The machine is easy to use and provides excellent defect analysis capabilities. Sub-micron process control is made possible through the use of precise masking and automated exposure scanning. Precise feedback control with automatic exposure of to multiple layers and a wide range of patterning and optimization options further improve accuracy and efficiency. Highly sensitive photoresist systems such as this offer excellent resolution, uniformity and defect reduction for more challenging technologies such as mobile phone cameras, optical components and integrated circuits. FSI MERCURY's precision photoresist tool is an excellent solution for the lithography of 3D components with high precision and repeatability.
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