Used FSI / TEL / TOKYO ELECTRON Mercury #9120352 for sale

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ID: 9120352
Wafer Size: 8"
PFA Turntable, 8".
FSI MERCURY is a proprietary photoresist equipment specially formulated for macroelectronics and semiconductor applications. It is an ultra-thin film of resist polymer, capable of releasing or trapping energy needed to transfer desired patterns to physical substrates. The system consists of a base liquid-photoresist material combined with developer and radiation, which allows for transferring an image of a circuit or component in circuit-making. This photoresist unit is available in various formulas that are suitable for usage on a wide variety of substrate materials, such as aluminum, copper, glass, silicon, semiconductors, gallium arsenide and quartz. When exposed to ultraviolet (UV) radiation, MERCURY resists polymer decomposes, creating an etch image. The material also has high lateral resistance, which prevents undercutting or delayering. FSI MERCURY utilizes several layers of specialty components which give it superior performance over other photoresists. The machine starts with the polymerized resist material, also referred to as the film. The film is applied on substrates by a spin-coating process and cured by an UV-light exposure in order to improve film quality. Additionally, additional radiation is used to expose the desired pattern onto the pre-coated wafer. Once the resist is exposed, an in-line asher can be used to recover the unexposed resist film, through a fluorine-based curing process, which forms a permanent bond. This enables it to be easily photolithographically etched. As for the post-develop stage, it is essential that the exposed material is cleanly stripped away, leaving a high-resolution image behind. MERCURY photoresist tool also includes a high-quality developer that helps provide the best solutions for maintaining resolution and quality when lifting contact masks. This ensures that the underlying substrate is not damaged by the etch process. To summarize, FSI MERCURY is a thin-film resist asset which utilizes multiple components and processes to transfer an image onto a substrate. With its advanced technologies and numerous benefits such as flexibility, cost-effectiveness, and superior resolution, MERCURY provides an optimal solution for macroelectronics and semiconductor applications.
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