Used VARIAN E11004390 #148167 for sale

ID: 148167
Standard type accel column (black) for E220/E500.
VARIAN E11004390 is an ion implanter and monitor designed to provide efficient, reliable and cost-effective material implanting and monitoring. This device is used in the semiconductor industry for the purpose of creating precisely placed patterns and structures on substrates such as silicon wafers. Ion implantation is a process in which ions are generated at high energy levels and accelerated toward a substrate. As the ions collide with the atoms of the substrate, they are embedded into the material. This process allows for the creation of small features which can be used to form devices such as transistors and resistors. E11004390 is capable of implanting a variety of ions, including boron, gallium, arsenic, phosphorous, and indium. The device includes a software-controlled ion source, accelerating column, and beam mapping equipment. The ion source produces ions at high energies and the accelerating column accelerates the ions to a desired level. The beam mapping system ensures that the ions are properly aligned to the correct area of the substrate. VARIAN E11004390 is equipped with an advanced control unit which provides real-time monitoring of all process variables, including temperature, pressure, and acceleration. This allows for precise control over the ion implantation process. E11004390 also includes a data logging machine which can store information on up to six different substrates. This information can be used to access device performance and track process trends over time. The device's design also includes a range of other features which improve substrate yield and have become an industry standard. These include an ion isolation tool to prevent unwanted ions from entering the beam and a fully sealed enclosure to protect components from dust and particles. Overall, VARIAN E11004390 is an advanced and reliable ion implanter and monitor that is specifically designed to provide superior material implanting and monitoring. This device provides efficient and cost-effective solutions for the semiconductor industry, and its range of features ensures that its users have access to the highest quality materials and technology available.
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