Used VARIAN VIISTa 810XP #9111187 for sale

VARIAN VIISTa 810XP is an advanced ion implanter and monitor designed for a wide variety of semiconductor device fabrication processes. This advanced equipment is capable of handling both single and dual-barrel configurations for both RIB (Razor Edge Ion implanter Beam)and AVS-Ion (Atomized Vacuum Spout Ion) applications. It is capable of achieving high dose rates, critical accuracy and unmatched throughput. It is also equipped with an intelligent beam control system which accurately sets beam currents to precisely match requirements. VARIAN VIISTA 810 XP has a number of unique features that make it the ideal solution for a variety of different applications. Its ion source operates in an ultra-high vacuum (UHV) environment, which allows it to reach very high resolutions. Its source accelerates ions to high energies and powers ranging from 30 to 140 keV for a variety of different species including silicon, silicon boride, boron, arsenic, phosphorus, and neon. It has a good mechanical design that creates a low gas dust chamber, which also helps reduce power losses and beam scattering. VIISTa 810XP also has a configuration control subsystem that can be used to maintain a high degree of process control and beam quality. This unit consists of a vacuum machine controller, which can be connected to multiple host systems, as well as an integrated report generator that provides real-time data analysis and predefined reports. In addition, the tool features a range of alarms and diagnostics that include both predictive and corrective maintenance functions. VIISTA 810 XP can also be configured to perform trimming and depth profiling processes. It is equipped with a multi-zone source which enables implantation, range adjustment, and simultaneous profiling according to user-defined parameters. The asset also has a highly accurate shooter and energy control module which makes implant manipulation easy. Finally, its low noise, low energy amplifier ensures that the beam power can be accurately adjusted without generating audible noise. Overall, VARIAN VIISTa 810XP is a highly advanced ion implanter and monitor that provides very stable processes and excellent beam quality. It is ideal for a wide range of semiconductor processing and fabrication applications. It is easy to configure and has the tools necessary to monitor and maintain a high degree of process control.