Used AJA ATC Orion 5 UHV #9049698 for sale
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ID: 9049698
Vintage: 2006
Sputter coater
Currently configured for manual operation, fully automatic capable
Substrate bias and rotation
(3) Independent sputter guns
(2) DC Power supplies, 500W
RF Power supply, 300W
Substrate size:
< 5.75" diameter (sputter-up) with z-axis shift (2")
Rotation to 20 rpm
Heating up to 800ºC with RF bias capability to 50 W RF
Sputter guns:
(3) 2" O.D. Targets
With integrated shutters for RF or DC (metallics/dielectrics) sputtering
Confocal, sputter-up arrangement
Capable of being upgraded to (5) cathodes
Power supplies:
(2) ADVANCED ENERGY 500 W DC supplies
1300 W Seren RF generator with manual impedance match and selector switch
Substrate heating:
PID Temperature programmable controller
(2) 1000 W Quartz lamps for heating inside water-cooled reflector box
Vacuum generation:
PFEIFFER 500 L/sec turbo pump
With magnetic bearing on vac side and ceramic bearing on motor side
Backed by ADIXEN ACP15 dry rotary lobe pump: Oil-free deposition system
Sputtered: metals and metal oxides:
Copper
Precious metals
Nickel
Iron
Vanadium
Molybdenum
Aluminum
Alumina
Carbon / Graphite
Currently de-installed and stored in a cleanroom
2006 vintage.
AJA ATC Orion 5 UHV is a sputtering equipment used in processing materials with a high level of accuracy and precision. This advanced system utilizes a powerful high-vacuum unit, capable of sustaining a maximum vacuum pressure of 6.5x10-7 Torr. It features a 5-target sputtering chamber, with 8-grounded heated anodes, allowing for different sputtering configurations, including high-power and low-power sputtering operations. The machine also includes a modular design, with an adjustable target-to-substrate distance, and an automated high rate plasma cleaning feature. In addition to sputtering advancements, ATC Orion 5 UHV tool features temperature control for substrates. This asset supports an active heating range up to 500°C, allowing for precise temperature control of the substrate surface. This feature provides greater control over film morphology and composition, as heat treatment can drastically influence the properties of metallized components. AJA ATC Orion 5 UHV offers precise motion control to enable accurate coating deposition without contaminating the target surface. The motion control allows for flexible programming, with linear and helical scan patterns, to ensure even film deposition rate. It also features an oscillation scan model, which precisely scans the target by oscillating the target in the X-Y plane to reduce the effects of target inter-diffusion. Finally, ATC Orion 5 UHV features an advanced automation equipment to ensure accuracy and repeatability within sputtering process parameters. This system includes computer-controlled operation, a multi-program sequencing capability, and user-friendly graphical programming tools for easy operation. It also tracks sputtering parameters and parameters to ensure repeatability and reproducibility of coating results. Overall, AJA ATC Orion 5 UHV is a powerful and highly precise sputtering unit, ideal for conducting thin film deposition processes. Its active heating range and precise motion control offer greater control over the deposition of materials. Its automated functions maximize efficiency, and reduce the time required for processing materials. With these features, ATC Orion 5 UHV is the perfect solution for many thin film applications.
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