Used ANATECH / TECHNICS HUMMER II #9053245 for sale

ANATECH / TECHNICS HUMMER II is a state-of-the-art sputtering equipment that has been designed to increase overall productivity when sputtering thin films in industrial and academic research environments. It includes both DC and RF power supplies to serve as a versatile tool for a variety of sputtering applications. The system has four 6" liners, four loadlock ports, and a high efficiency magnetic suspension target holder. All of these features allow for high-throughput sputtering of large deposition areas. The target holder also provides a reliable, consistent substrate-to-target distance over time while allowing for optimal sputtering conditions. The software integrated into the unit is highly user-friendly and offers a wide variety of options for enhancing the productivity and accuracy of the sputtering process. The machine also provides for a precise control of deposition parameters such as power, deposition rate, and oxygen compatibility. ANATECH HUMMER II utilizes innovative and patented technologies to ensure maximum efficiency when compared to other sputtering systems. For example, the innovative cathode design minimizes gas scattering, which ensures a clean discharge as well as consistent deposition rates. The engineered gas flow arrangement ensures homogeneous film uniformity and optimal thermal stability. The tool also has a unique dual chamber design that allows for rapid thermal cycling and simultaneous processes in both chambers. This means that the user can sputter two different materials in parallel, or use one chamber for a single material and the other chamber for another material. Lastly, ANATECH offers a full-service maintenance plan for TECHNICS HUMMER II that includes full calibration and preventive maintenance. HUMMER II complies with all safety regulations and is certified to ISO 9001, EMC, and NRTL/C standards. This ensures that the asset is reliable and performs safely under any circumstances. In conclusion, ANATECH / TECHNICS HUMMER II is an innovative, reliable, and highly efficient sputtering model that is perfect for commercial, industrial, and academic research environments. It offers a variety of features that increase throughput and accuracy while maintaining a high level of safety and reliability.