Used LEYBOLD / BALZERS Z 590 #9184058 for sale

LEYBOLD / BALZERS Z 590
ID: 9184058
Sputtering system.
LEYBOLD / BALZERS Z 590 is a high-performance sputtering equipment designed for coating large-area substrates with thin films. The system utilizes an high-power inductively coupled plasma (ICP) source to generate a steady stream of ions that bombards a high-purity solid target material and sputters away the target material atoms in a directed manner. The ejected atoms travel toward the substrate and form an homogeneous thin film on its surface. This sputtering procedure is highly precise and yields reliable thin film characteristics. LEYBOLD Z 590 includes a highly integrated control unit with automated setting of sputtering parameters, enabling easy operation and precise control of the thin film deposition processes. The machine also includes advanced ion source components, such as a low-noise high-power radio frequency (RF) generator, an optimized ICP source with a wide power range and a high-power matching network for optimal matching of the ICP source to the target. BALZERS Z 590 also features an automated cleaning and conditioning tool with a retractable scraper for removing unwanted deposits from the target. The cleaning asset uses argon and oxygen gas mixtures to achieve optimal cleaning efficiency. Additionally, Z 590 includes a high-precision positioning model with paddles and a special tracking equipment that can locate the exact position of the substrate, allowing for precise alignment of the sputtering target. In terms of safety, LEYBOLD / BALZERS Z 590 is constructed with a shielding compartment that provides radiation protection to the user. It is also equipped with a programmable interlock system that prevents unauthorized access to hazardous components. Moreover, the unit includes an advanced diagnostic machine that monitors the pressure in the deposition chamber, enabling users to easily detect gas leaks or other faults. In conclusion, LEYBOLD Z 590 sputtering tool is an ideal choice for applications requiring reliable and precise thin film deposition. It provides a user-friendly interface and advanced features to make the thin film deposition process highly efficient and reliable. Its advanced safety features ensure safe and secure operation, making it an ideal choice for a variety of thin film deposition applications.
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