Used K&S 971 #9100207 for sale

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K&S 971
Sold
Manufacturer
K&S
Model
971
ID: 9100207
Wafer Size: up to 8"
Microwash station, up to 8" Handles up to 10" diagonal substrates For sawed/scribed wafers, photomask and other substrate cleaning Oscillation High pressure DI spray arm - up to 2000 psi Filtration at 0.2um Combined chamber exhaust and drain Built in safety interlocks Nitrogen dry Infrared heat lamp 115V, 50/60 Hz, 6A.
K&S 971 is a wafer and mask scrubber, developed by K&S Corporation. 971 is a one-step wafer and mask scrubber designed to deliver superior results in a cleanroom environment. It is ideal for the semiconductor, medical, and photolithography industries. K&S 971 is a wet-type scrubber, featuring a chemical-resistant stainless steel wash basin with an adjustable-height level, which allows for consistency in scrubbing. The basin contains a lid, which consists of a durable Teflon lining to repel water and chemical spills. The scrubber is powered by a motor, which activates the rotation of brushes that can be programmed for customized scrubbing according to the operator's needs. Additionally, the brush speed and direction can also be adjusted, allowing for precision user-defined processes. A disk detachment equipment is also used, which assists the scrubber in automatically removing the disk from the scrubber after the process is complete. 971 wafer and mask scrubber utilizes a high-pressure water system, making it capable of reaching a fixed pressure output of 4 bar (58 psi). This ensures consistent results when scrubbing at the same pressure setting. Additionally, the scrubber guarantees a consistent and thorough scrubba, eliminating any contamination and debris. K&S 971 is also equipped with an overflow and water level control unit that prevents water-logging of the scrubber. The scrubber also features a variety of safety features, such as emergency switches, safety doors, and break detectors. This ensures that the operator is operating the scrubber safely and according to industry standards. Additionally, the scrubber has an advanced filtered water machine, which is designed to eliminate all contaminants from the water used. Overall, 971 is a reliable and safe wafer and mask scrubber that is designed to deliver consistent and precise results. Its combination of adjustable cleaning brushes, consistent water pressure, as well as its safety features make it an ideal scrubber for the cleanroom environment.
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