Used ASML PAS 5500 / 100D #9202567 for sale

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Manufacturer
ASML
Model
PAS 5500 / 100D
ID: 9202567
Wafer Size: 8"
Vintage: 1996
i-Line stepper, 8" Process: Front end & back end CPU Type: SPARC5 CM options: Lens number: 7556500A Lens type: 75 Field diameter: 31.1 ARMS/RMS: RMS Chuck type: Zerodur Athena: No Parameter Illumination: 22.0X22.0 mm (%): <2 Intensity: >900 (mw/cm²) Lens distortion: Red blue NCE (nm): 0.0001<X<78 Magnification (ppm): -3< x <3 Reticle table tilt Rx (µrad): -10<X<10 Reticle table tilt Ry (µrad): -10<X<10 Reticle table height (µm): -10<X<10 Focal: Image tilt Rx (µrad): -5<X<5 image tilt Ry (µrad): -5<X<5 Focus height (µm): -0.8<X<-0.6 Overlay: Machine overlay to /100C or /100D: X<120 Reference machine (nm): Y<120 FPD (µm): 0.40 AST (µm): 0.407 CIM Linked 1996 vintage.
ASML PAS 5500 / 100D is a wafer stepper that is specifically designed for a variety of industrial uses, including production microelectronic devices. This device provides added accuracy and precision during production, allowing for greater automation of processes. The device is built with a durable, high-grade steel body, which is finished to provide superior performance during production. Additionally, it is outfitted with a variety of mechanical and electronic features that provide superior performance. This includes a scanner for controlling beam, laser, motors, and other components; an integrated alignment control equipment; wafer position; and an elevating mechanism for exchanging the cassette. ASML PAS 5500/100D consists of three main components: the laser, the scanner, and the projection optics. The laser module is responsible for generating street formation, which are used to perform the necessary patterning on the wafer. The scanner is used to move the laser beam in order to create the desired street patterns, and the projection optics are used to optimize the quality of the projected image. To ensure accurate patterning, the laser module is build with a high resolution and dynamic range, while the scanner is built to give excellent contrast and creation of intricate patterns. Additionally, the device is outfitted with a patented autotracking system, which allows the machine to automatically adjust the laser beam according to the wafer pattern. This allows for faster and more accurate production time, increasing automation of the process. Moreover, PAS 5500 / 100 D is designed to provide improved dimensional accuracy by means of a sophisticated stepper calibration unit. This machine monitors and adjusts the build-up of exposure dose and overlay accuracy during the exposure sequence, and provides a precise level of control. Additionally, it is equipped with an advanced reticle replacement tool and a clever tray positioning asset, which eliminates any flaws in positioning the wafers and keeps downtime to a minimum. Overall, PAS 5500/100D is a high-precision wafer stepper that is specifically designed and built for a variety of industrial uses. It offers a variety of features that make it highly efficient in patterning and exposure, and its inclusion of a sophisticated autotracking model makes it faster and more accurate than ever.
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