Used ASML PAS 5500 / 275D #9188744 for sale

ASML PAS 5500 / 275D
Manufacturer
ASML
Model
PAS 5500 / 275D
ID: 9188744
Wafer Size: 8"
Vintage: 2008
i-Line stepper, 8" 2008 vintage.
ASML PAS 5500 / 275D wafer stepper is a dual-beam, computer-controlled projection photolithography equipment. It is used in the production of semiconductor devices (such as ICs and MEMS). The stepper has two light sources—a 248 nm wavelength KrF excimer laser beam and a 193 nm wavelength ArF excimer light—that are modulated to focus on the target area on the substrate. The light sources allow for high-resolution lithography operations with a minimum feature size of 0.18 μm. The PAS 5500 has a wafer stage system that positions the wafer in the beam path and rotates the wafer to align each die with the beam. This wafer stage unit is capable of speed and accuracy in the order of nanometres and seconds. Additionally, the machine is designed for operation at temperatures as low as 16ºC. The tool is able to achieve submicron accuracy through the use of a two-dimensional alignment asset. This model uses a three-axis stage and four CCD cameras to ensure precise registration of the wafer before exposure. ASML PAS 5500 uses a five-axis, double MST (mechanical stage translator) scan head to pattern the wafer in a more efficient manner. The PAS 5500 is equipped with an advanced imaging equipment that enables high resolution imaging of microstructures on the wafer. This includes a micro-optics and multilayered optics imaging system, with an NA (numerical aperture) of up to 0.5. The unit also features a dedicated scanning software suite for full wafer processing and inspection. This includes the Scan Tool for automatic wafer positioning, Stepper Tool for automatic pattern alignment, and Exposure Tool for automated exposure. The software suite allows for a user-friendly control of the processes, reducing time and human intervention. Overall, PAS 5500 / 275D is an industrial-grade, dual-beam projection-type stepper that is engineered for precision lithography applications in the semiconductor industry. Its features combine for advanced wafer processing, allowing for the production of integrated circuits with faster throughput and higher yields.
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