Used KLA / TENCOR / ICOS CI-T120 #9149645 for sale

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ID: 9149645
Lead scanner Device type: QFN, TSOP, QFP, BGA, SOP Input-output: Tray to tray Tape to reel Includes: (4) Padestals (2) Tape heaters (5) Tape kits QFN Type lead scan module Calibration tools 2011 vintage.
KLA / TENCOR / ICOS CI-T120 Mask & Wafer Inspection Equipment is an advanced semiconductor imaging and inspection system. It has been designed for pinpointing sub-micron defects on a wide range of mask and wafer surfaces. KLA CI T120 is an optical inspection unit and is one of the most advanced systems of its type. It features a brightfield optical microscope designed to accurately inspect and detect particles and other defects within the pattern areas on a mask or wafer. It utilizes advanced image processing algorithms to display defects with great accuracy and various measurement techniques to help ensure quality control. ICOS CI T 120's machine utilizes an advanced, high-resolution image sensor and optimized optics which allow for extremely high-magnification, providing a 3D imaging capability at resolutions as small as 0.5 microns. This image resolution and magnification has been proven to help detect and characterize particles and other defects on patterns in both flat panel displays and integrated circuits. TENCOR CI-T120 is accompanied by 3 software solutions: CORE PartsFinder, which provides real-time detection and analysis of defects; KXDI for defect classification; and Check-It InSight software for assessing and minimizing noise within the image. It makes use of Teratech's image recognition for defect analysis as well. In terms of performance, TENCOR CI T120 is one of the best in the market. It has a fast inspection speed, excellent defect coverage and high throughput rate. It is a suitable tool for both research and production purposes, since it can detect very small particles and other defects on a wafer or mask. Overall, KLA CI T 120 Mask & Wafer Inspection Asset has been designed to provide a high-resolution, accurate and reliable solution for detecting small particles and other defects on a wide variety of mask and wafer surfaces. It has a fast inspection speed and excellent defect coverage, making it an ideal choice for research and production purposes.
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