Used ADE / KLA / TENCOR Ultragage 9500 #9182331 for sale

ADE / KLA / TENCOR Ultragage 9500 is a comprehensive wafer testing and metrology equipment designed for use in semiconductor manufacturing. It is capable of testing and measuring thin films up to 0.5mm thick, consists of two imaging systems, and can gather data with high-precision 3D non-contact scanning. It is especially renowned for its ability to image glossy or reflective surfaces with maximum accuracy and resolution. The system can perform a wide range of tests, including electrical characterization, electrical defect analysis, and defect tracking, and can also be used to identify contamination present in the wafer. ADE Ultragage 9500 has a fully automated optical unit with motorized focus, stepper motors for X, Y, and Z movement, and a Graphical User Interface (GUI) that provides users with an interactive view of the wafer and the measurements being taken. It can measure high-resolution film thicknesses with a resolution of 1 nanometer, and can accurately measure micro-edge defects in 1.4-micron lines with repeatable accuracy. Additionally, it can obtain full-field measurement results for both scan and non-scan measurements, allowing for in-depth wafer characterization. KLA Ultragage 9500 also has a fully automated 3D topography capability, allowing for the measurement of elevated features down to 100 nanometers in size. It is equipped with automated defect detection and analysis tools, allowing for the inspection of isolated single-point defects and alignment patterns. Additionally, it has a semi-automated image analysis (SMIA) feature that can be used to identify critical dendrites, parasitic lateral overgrowths, and other defects, providing users with the most in-depth detection and analysis of wafer characteristics. Moreover, Ultragage 9500 can be configured for both inline production and machine R&D applications, providing advanced in-service diagnostic and process capabilities. It is a cost-effective way to achieve comprehensive wafer testing and measurement, and, as such, is applicable for many advanced semiconductor processes.