Used FOUR DIMENSIONS 280SI #9180333 for sale

FOUR DIMENSIONS 280SI is a wafer testing and metrology equipment designed for semiconductor wafers. It is an integrated system, which is the most advanced wafer metrology platform available. It is an ideal solution for wafer testing and metrology applications in both research and production environments. 280SI uses a patented technology called 'Raster Beam Analysis', which provides highly accurate 2D and 3D measurements and analyses of multiple parameters across the whole wafer. This helps in optimizing the wafer processes and verifying its critical dimensions and parameters. The unit supports the following wafer measurements: photo-optical, optical imaging, surface topography, and contact probe techniques. It is capable of measuring the thicknesses and feature sizes of multiple layers with great precision and accuracy using interferometry and spectroscopy techniques. In addition, it also has a 4D imaging machine to measure depth and three-dimensional topography with sub-wave accuracy. FOUR DIMENSIONS 280SI tool comes with data analysis and processing algorithms that allow for comprehensive characterization of wafers. It also features a large touch screen to interact with the operator. By connecting with a central database, the operator can save and analyze acquired data. The asset has standard PC connectors, allowing the user to integrate 280SI into their existing network and use it in a distributed environment. This allows for cross-model compatibility, integration, and advanced data sharing and analysis. With its multiple interfaces, the equipment is easily configurable to fit into any operating environment. The robust mechanical design of the system ensures durability and supports wafers up to 8". Its intuitive and user-friendly GUI is designed to minimize machine downtime and optimize operation. FOUR DIMENSIONS 280SI delivers outstanding precision and accuracy at high speed, making it ideal for any metrology operation. With its innovative technologies and features, it is the ultimate wafer metrology platform that can provide reliable and accurate results with increased throughput for both research and production purposes.