Used ASM Advance 300 VT #9206101 for sale

ID: 9206101
Vintage: 1997
Vertical LPCVD furnace Process: Oxide CIM Main system: Main body (Carrier stage) Utility box Handler system: Wafer handing robot Boat elevator Cassette loader General configuration: System layout type: U/Box type(I) System hand: LL N2 Load lock Heater type: Temp wire Torch heater Process gasses: Gas 1 / N2(30SLM) Gas 2 / O2(20SLM) Gas 3 / HCL Gas 4 / N2O Gas 5 / H2O Gas distribution system: Basic style: Conventional gas system Tubing material: Stainless steel Tubing finish: Nupro MFC Unit Wafer/Cassette handling: Wafer type: 8" SEMI STD-Notch Cassette type: Entergris/704-503T2 (25) Cassette wafers (16) Cassette storage Fork type/Material Boat / Pedestal: (150) Production wafers Does not include boat rotation System controls: System controller: IBM 486 OS2 Torch controller: H2O Separate element pre burner Signal tower colors: G/A/B General pressure display units: Pressure PSI Cabinet exhaust display units: H2O ASM Furnace temp controller Host communications: Host communications: User host computer User host computer I/F: SECS I/II (RS232) Information transfer protocol: GEM Equipment host I/F connection: U/BOX Top HIA Group controller Power input: Voltage: 3-Phase, 208VAC Voltage: 1-Phase, 120VAC UPS Input / Output voltage: 120V/100V 1997 vintage.
ASM Advance 300 VT is a diffusion furnace and accessories system manufactured by ASM International. It is designed to be a modular, comprehensive etching and deposition system that incorporates components suitable for a wide range of applications in semiconductor research and manufacturing, MEMS research and manufacturing, and solar cell production. The Advanced 300 VT has several critical features for successful diffusion furnace operations. It is equipped with a vacuum diffusion furnace, a single-stage, low-pressure process chamber, a pyrometer and thermocouple for temperature control, and a resistance-heated susceptor. The furnace also includes an independently controlled pyrometer for gas exhaust control. The furnace has an ultra-low energy consumption due to its low power consumption in heating and cooling cycles, helping to reduce overall costs. For more precise control over the process, the Advanced 300 VT includes a digital Varian 801 source for controlling the rate of temperature change, as well as an onboard microprocessor for real-time control of process parameters. The microprocessor is also used in conjunction with a graphical user interface or programmable logic controller (PLC) for easy adjustment of diffusion furnace parameters. The furnace integrates seamlessly with other equipment, such as an On-Wafer scanner for controlling both substrate alignment and temperature profile. It also has many manual and automated steps to ensure perfect uniformity, such as auto-temp control and flow control. The Advanced 300 VT also boasts high-speed, high-accuracy process cycles, allowing for higher throughput. It is capable of shorter process times due to the automated profile control, and the ability to modify process parameters as desired. The vacuum chamber also offers a constant temperature for efficient optimal diffusion and contains a susceptor chuck to prevent debris from entering the chamber and causing damage. The Advanced 300 VT is also designed for safety - level 1 & level 2 safety features and a special design to keep the user protected from thermal radiation and excessive temperature during normal operations. The Advanced 300-VT offers precise, repeatable process cycles that allow users to improve their productivity and reliability. It is the perfect choice for research and manufacturing applications, due to its versatility, efficient operation, and excellent expandability.
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