Used BRUCE BDF-41 #69381 for sale

BRUCE BDF-41 Diffusion Furnace and Accessories is a high-temperature furnace designed for material deposition and crystallization. The furnace is comprised of a hermetically sealed enclosure, an induction heater, and other necessary components. The induction heater of BDF-41 utilizes electric fields for heat generation and is capable of reaching temperatures of up to 1450°C. The furnace also includes a crucible holder that is composed of high-alumina ceramic components and can securely hold up to 15 cm3 of material. The crucible used in BRUCE BDF-41 is of a special type with flat bottoms to allow for a uniform temperature across the material. The furnace is commonly used for a variety of materials such as silicon, germanium, and other materials used in semiconductor fabrication, thanks to its precise temperature control and quick ramp-up and cool-down functions. The multiple temperature zones that make up the furnace can be independently tuned, allowing for perfect temperature uniformity. The furnace also features an automated profile controller that allows users to set customized temperature profiles and keep them consistent throughout the processing. In addition, BDF-41 includes a gas syphon tube and a safety pressure relief valve to provide access to an argon supply for the furnace. Furthermore, a monitored system is included to allow for automatic control of pressure and other parameters, allowing for further improvements in the uniformity of the process. BRUCE BDF-41 also includes a full set of accessories, such as an anode sheath for an electron beam gun capable of reaching temperatures up to 2000° C in a confined space. This section also includes a quartz crucible along with other components necessary for different processes. In conclusion, BDF-41 Diffusion Furnace and Accessories is a comprehensive system designed to provide high-temperature processing of various materials in a uniform and consistent manner. It provides greater precision and efficient temperature control, hence making it an ideal choice for semiconductor and other material processing needs.