Used HITACHI / KOKUSAI V-3(J3) #9191591 for sale

HITACHI V-3(J3) is a diffusion furnace designed for high-volume production efficiency and advanced high quality diffusion. It offers excellent processing performance, precision temperature control accuracy, and reliability. It is ideal for production of optoelectronics, semiconductor wafers, and a variety of other products that require fine control of the diffusion process. This furnace is driven by an innovative vertical centerline driven hotwall construction, which reduces thermal gradients and improves thermal uniformity in the furnace. The V-3(J3) is equipped with a unique pressure differential control system that is designed to provide stability in temperature, pressure, and other operating ranges. This control system helps maximize processing results in even the most fragile of process. The V-3(J3) also features a three-phase Preheating Chamber, which can act as a preheat as the wafer enters the furnace. This allows for more even diffusion temperatures throughout the substrate, resulting in better yield and higher throughput. The user-friendly design of the V-3(J3) allows for simple setup and operation without a technician, enabling higher throughput and less waste of time and energy. Additionally, an OLED touchscreen panel offers a user-friendly interface, providing access to the control settings and processes with ease. The V-3(J3) features high-performance insulation materials, a two-stage low-voltage blower, and a cooling fan for optimal efficiency and processing stability. The advanced safety features include over-temperature alarms and a safety circuit to prevent accidental heating events. This high-performance diffusion furnace is designed to meet the needs of production environments with high-capacity diffusion processing requirements and stringent precision. Its ease of use, reliable performance, and high-quality diffusion make KOKUSAI V-3(J3) ideal for a range of industries and applications.