Used KOKUSAI DD-802V-B #9044527 for sale

KOKUSAI DD-802V-B is a diffusion furnace and accessories equipment designed to provide an efficient and cost effective production of advanced semiconductor products. It is composed of process chambers, wafer boats, thermal heating elements, pumps, and process chambers with integral quartz tubes. The main process chamber is made from stainless steel and has a volume of 47 liters. The chamber is equipped with a vessel that has a maximum temperature of 1200°C. The wafer boat has three temperature zones ranging from 300°C to 1200°C, allowing for efficient process control during wafer production. The heating elements provide a homogenous heating of the wafer boat during diffusion process. The integral quartz tube facilitates doping on the wafer surface during diffusion process. The quartz tube has a temperature stability of 1°C, and the internal volume of the tube can be adjusted to increase or decrease the doping process. Additionally, there is a pump that is integrated into the process chamber. This pump is used to ensure effective flow of chemicals during diffusion process. KOKUSAI DD-802VB's process chamber is equipped with three gas inputs. This is used to allow the process to be run at various atmospheres, like reducing, oxidizing and inert. In addition to gas inputs, the process also includes a pressure and temperature monitor, allowing for accurate control of the diffusion atmosphere. The system is equipped with safety features such as a thermocouple connected to the wafer boat and process chamber to monitor the temperatures of both during the production process. Additionally, a gas/air-flow unit is used to ensure safe and efficient removal of any harmful emissions during the process. Overall, DD-802V-B is a reliable and efficient diffusion furnace and accessories machine. It has been designed to provide a cost effective production of advanced semiconductor products, allowing companies to increase their product quality and reduce operational costs. It offers various safety features to ensure a safe working environment for operators. The integral quartz tube allows for convenient doping, increased temperature stability and improved control of the diffusion atmosphere.