Used KOKUSAI DJ-835V-8BL #9095897 for sale

KOKUSAI DJ-835V-8BL is a diffusion furnace and accessories designed to provide precision annealing and doping of semiconductor materials. It features a range of features that make it optimal for temperature gradient and precision annealing of semiconductors, as well as doping processes such as epitaxial deposition, alloying, and substrate metallization. DJ-835V-8BL diffusion furnace is equipped with a single cylinder split tube furnace. The top and bottom portion of the tube can be used for separate processing runs. The tube has double walls for thermal insulation, and the interior is equipped with molybdenum heater and thermocouple for precise temperature control. The top part of the tube is sealed by gas diffusion, while the bottom part is left open for access and manipulation of materials. KOKUSAI DJ-835V-8BL diffusion furnace features a wide range of accessories designed to make semiconductor materials processing much easier and more reliable. The interior of the tube is equipped with a ceramic chamber for mounting and positioning substrate wafers in the precise location needed. A vacuum sealer is also included for securely sealing the tube against contamination. Each equipment also features an inert gas-injection system to supply pure argon and nitrogen atmospheres, while a pressure profile controller provides precise control of the atmosphere for optimal processing conditions. DJ-835V-8BL diffusion furnace offers a wide range of temperature and pressure settings. Substrate temperatures can be set from 500°C to 1000°C using the temperature profile controller, and temperatures can be increased or decreased in increments of 0.1°C for precise control. Pressure control for the unit is also available with a range of gas pressure settings from 0.1 to 5.5 atmospheres, and the pressure profile controller makes it easy to maintain both temperature and pressure in the optimal range. KOKUSAI DJ-835V-8BL diffusion furnace and accessories offer flexibility and reliability for semiconductor materials processing. Its advanced features make it ideal for precision annealing, doping processes, and alloying of materials. Whether you're a professional semiconductor company or university laboratory, this machine provides the perfect combination of features to help you achieve high precision results.